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Volumn , Issue , 2011, Pages

RF characterization of epitaxial graphene nano ribbon field effect transistor

Author keywords

characterization; graphene; RF; ribbon; SiC; transistor

Indexed keywords

AFM; CURRENT GAINS; CUT-OFF; EPITAXIAL GRAPHENE; HALL MEASUREMENTS; HIGH-SPEED ELECTRONICS; MAXIMUM OSCILLATION FREQUENCY; RF; RF CHARACTERIZATION; RIBBON; SIC;

EID: 80052322072     PISSN: 0149645X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/MWSYM.2011.5972627     Document Type: Conference Paper
Times cited : (18)

References (14)
  • 5
    • 57349090160 scopus 로고    scopus 로고
    • Current saturation in zero-bandgap, top-gated graphene field-effect transistors
    • Nov.
    • I. Meric, M.Y. Han, A.F. Young, B. Ozyilmaz, P. Kim, and K.L. Shepard, "Current saturation in zero-bandgap, top-gated graphene field-effect transistors," Nat Nano, vol. 3, Nov. 2008, p. 654-659.
    • (2008) Nat Nano , vol.3 , pp. 654-659
    • Meric, I.1    Han, M.Y.2    Young, A.F.3    Ozyilmaz, B.4    Kim, P.5    Shepard, K.L.6
  • 8
    • 67649214239 scopus 로고    scopus 로고
    • 80 GHz field-effect transistors produced using high purity semiconducting single-walled carbon nanotubes
    • June
    • L. Nougaret, H. Happy, G. Dambrine, V. Derycke, J.-.Bourgoin, A.A. Green, and M.C. Hersam, "80 GHz field-effect transistors produced using high purity semiconducting single-walled carbon nanotubes," Applied Physics Letters, vol. 94, June. 2009, p. 243505-243513
    • (2009) Applied Physics Letters , vol.94 , pp. 243505-243513
    • Nougaret, L.1    Happy, H.2    Dambrine, G.3    Derycke, V.4    Bourgoin, J.5    Green, A.A.6    Hersam, M.C.7
  • 10
    • 77954334493 scopus 로고    scopus 로고
    • Atomic scale flattening,step formation and graphitization blocking on 6H- and 4H-SiC{0001} surface under Si flux
    • Dec.
    • J.F. Fernandez, E. Moreau, D. Vignaud, S. Godey, and X. Wallart, "Atomic scale flattening,step formation and graphitization blocking on 6H- and 4H-SiC{0001} surface under Si flux," Semiconductor Science and Technology, vol. 24, Dec. 2009, p. 125014.
    • (2009) Semiconductor Science and Technology , vol.24 , pp. 125014
    • Fernandez, J.F.1    Moreau, E.2    Vignaud, D.3    Godey, S.4    Wallart, X.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.