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Volumn 26, Issue 1-4, 2011, Pages 63-67

Depth-resolved correlation between physical and electrical properties of stressed SiNx gate insulator films

Author keywords

Depth profile; Gate insulator; Mechanical hardness; Nano indentor; Refractive index; SiN films

Indexed keywords

DEPTH PROFILE; GATE INSULATOR; MECHANICAL HARDNESS; NANO INDENTOR; SIN FILMS;

EID: 80051673125     PISSN: 13853449     EISSN: 15738663     Source Type: Journal    
DOI: 10.1007/s10832-010-9628-1     Document Type: Article
Times cited : (6)

References (15)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.