Optimization of plasma-enhanced chemical vapor deposition parameters for the growth of individual vertical carbon nanotubes as field emitters

Carbon

Volumn 49, Issue 13, 2011, Pages 4197-4203

  Loffler R ^a   Haffner M ^a   Visanescu, G ^a   Weigand, H ^a   Wang, X ^a   Zhang, D ^a   Fleischer, M ^a   Meixner, A J ^a   Fortagh J ^a   Kern, D P ^a  

^a UNIVERSITY OF TÜBINGEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CATALYST FILM; CATALYST VOLUME; ENHANCED GROWTH; FIELD EMITTER; FIELD-EMISSION BEHAVIOR; GROWTH BEHAVIOR; GROWTH PARAMETERS; GROWTH TIME; NICKEL CATALYST; STABLE EMISSIONS;

CARBON NANOTUBES; CATALYSTS; CHEMICAL VAPOR DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

PLASMA DEPOSITION;

EID: 79961031981     PISSN: 00086223     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.carbon.2011.05.055     Document Type: Article

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