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Volumn 83, Issue 9, 2011, Pages

Evolution of E-centers during the annealing of Sb-doped Si 0.8Ge0.2

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EID: 79960988203     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.83.094115     Document Type: Article
Times cited : (4)

References (21)
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.