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Volumn 35, Issue 2, 2011, Pages 27-34

Germanium fin structure optimization for future MugFET and FinFET applications

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; BUDGET CONTROL; DEFECTS; FINFET; GERMANIUM; RECRYSTALLIZATION (METALLURGY); SILICON WAFERS; STRUCTURAL OPTIMIZATION;

AMORPHOUS DEPTH; DOPANT ACTIVATION; E-BEAM LITHOGRAPHY; GERMANIUM WAFER; HIGH ASPECT RATIO; LOCALIZED DEFECTS; TWIN BOUNDARIES; [110] DIRECTION;

FINS (HEAT EXCHANGE);

EID: 79960779878 PISSN: 19385862 EISSN: 19386737 Source Type: Conference Proceeding
DOI: 10.1149/1.3568845 Document Type: Conference Paper

Times cited : (2)

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