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Volumn 95, Issue 10, 2011, Pages 2886-2892

Nanoimprint patterning for tunable light trapping in large-area silicon solar cells

Author keywords

Double texture; Light scattering; Pattern fidelity; Texture smoothing; Thin film solar cells; UV nanoimprint lithography

Indexed keywords

A-SI:H; DOUBLE TEXTURE; EXCELLENT PERFORMANCE; IDEAL SYSTEMS; INTERFACE MORPHOLOGIES; LIGHT-TRAPPING; NANO-IMPRINT; PATTERN FIDELITY; PHOTOVOLTAIC CHARACTERISTICS; POLYMER STRUCTURE; POLYMERIC LAYERS; TANDEM SOLAR CELLS; THIN FILM SOLAR CELLS; THIN-FILM SILICON SOLAR CELLS; TRANSPARENT CONDUCTIVE OXIDES; UV NANOIMPRINT LITHOGRAPHY;

EID: 79960556843     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2011.06.007     Document Type: Article
Times cited : (37)

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