Design of patterned surfaces with selective wetting using nanoimprint lithography

Macromolecular Chemistry and Physics

Volumn 211, Issue 24, 2010, Pages 2636-2641

  Bessonov, Aleksander ^a   Kim, Jeong Gil ^a   Seo, Jung Woo ^a   Lee, Jong Woo ^a   Lee, Sukwon ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

controlled wettability; lithography; nanoimprinting; nanotechnology; superhydrophobic surface

Indexed keywords

APPARENT CONTACT ANGLE; CONTROLLED WETTABILITY; FLAT CHANNELS; FLEXIBLE SURFACES; HIGH ASPECT RATIO; HYDROPHILIC PROPERTIES; HYDROPHILIC REGIONS; MICROSTRIPES; NANO-IMPRINTING; NANOPATTERNED SURFACES; NANOPILLARS; PATTERNED SURFACE; PLASTIC SUBSTRATES; POLYMERIC SURFACES; REPLICA TECHNIQUE; STATIC CONTACT ANGLE; SUPER-HYDROPHOBIC SURFACES; SUPERHYDROPHOBICITY; ULTRAHYDROPHOBIC; UV NANOIMPRINT LITHOGRAPHY; WENZEL THEORIES;

ASPECT RATIO; CONTACT ANGLE; FABRICATION; HYDROPHILICITY; HYDROPHOBICITY; NANOTECHNOLOGY; PHOTOLITHOGRAPHY; SELF ASSEMBLED MONOLAYERS; SURFACE PROPERTIES; WETTING;

NANOIMPRINT LITHOGRAPHY;

EID: 78650096258     PISSN: 10221352     EISSN: 15213935     Source Type: Journal    
DOI: 10.1002/macp.201000483     Document Type: Article

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