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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 29, Issue 4, 2011, Pages

Glancing angle deposition of Ge nanorod arrays on Si patterned substrates

(5) Khare, C a Fechner, R a Bauer, J a Weise, M a Rauschenbach, B a

a LEIBNIZ INSTITUTE OF SURFACE ENGINEERING IOM (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DOT ARRAY; ETCH MASK; GLANCING ANGLE DEPOSITION; HEXAGONAL SHAPES; HONEYCOMB PATTERN; MORPHOLOGICAL VARIATION; NANOROD ARRAYS; PARTICLE FLUXES; PATTERN PERIOD; PATTERN TRANSFERS; PATTERNED SUBSTRATES; REACTIVE ION BEAM ETCHING; SI(111) SUBSTRATE; TRIANGULAR SHAPES;

GERMANIUM; GOLD COATINGS; HONEYCOMB STRUCTURES; NANORODS; PHASE TRANSITIONS; POLYSTYRENES; REACTIVE ION ETCHING; SELF ASSEMBLED MONOLAYERS; SILICON; SUBSTRATES;

GOLD;

EID: 79960538558 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.3589781 Document Type: Article

Times cited : (11)

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