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Journal of Applied Physics

Volumn 81, Issue 9, 1997, Pages 5960-5965

Shapes of agglomerates in plasma etching reactors

(2) Huang, Fred Y a Kushner, Mark J a

a University of Illinois at Urbana Champaign (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AGGLOMERATION; COMPUTER SIMULATION; CONTAMINATION; DUST; ELECTRONS; ELECTROSTATICS; IONS; MATHEMATICAL MODELS; MICROELECTRONIC PROCESSING; MOLECULAR DYNAMICS; MORPHOLOGY; PLASMA ETCHING;

AGGLOMERATES; DUST PARTICLE CONTAMINATION; FRACTAL DIMENSION; KINETIC ENERGY; PARTICLE AGGLOMERATION MODEL; PARTICLE TRANSPORT; PLASMA ETCHING REACTORS; PLASMA PROCESSING;

PLASMA DEVICES;

EID: 0031141337 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.364384 Document Type: Article

Times cited : (22)

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