Deposition of hydrogenated amorphous carbon films from CH4/Ar plasmas: Ar dilution effects

Journal of Materials Science

Volumn 36, Issue 21, 2001, Pages 5295-5300

  Valentini, L ^a   Kenny, J M ^a   Mariotto, G ^b   Tosi, P ^b  

^a UNIVERSITY OF PERUGIA   (Italy)

^b UNIVERSITY OF TRENTO   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; CARBON; CRYSTAL LATTICES; CRYSTAL MICROSTRUCTURE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GLOW DISCHARGES; HYDROGEN BONDS; HYDROGENATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY;

AMORPHOUS CARBON FILMS;

AMORPHOUS FILMS;

EID: 0035505517     PISSN: 00222461     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1012422618327     Document Type: Article

References (20)