Boron-doped nanocrystalline silicon thin films for solar cells

Applied Surface Science

Volumn 257, Issue 21, 2011, Pages 8901-8905

  Fathi, E ^a   Vygranenko, Y ^b,c   Vieira, M ^b,c   Sazonov, A ^a  

^a UNIVERSITY OF WATERLOO   (Canada)

^b INSTITUTO SUPERIOR DE ENGENHARIA DE LISBOA   (Portugal)

^c UNINOVA   (Portugal)

Author keywords

Nanocrystalline silicon; PECVD; Solar cells; Thin solid films

Indexed keywords

ALUMINUM COATINGS; BORON; II-VI SEMICONDUCTORS; NANOCRYSTALS; OPTICAL PROPERTIES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON CARBIDE; SILICON SOLAR CELLS; SOLAR CELLS; SUBSTRATES; THIN FILM SOLAR CELLS; THIN FILMS; ZINC OXIDE;

COATED GLASS SUBSTRATES; CRYSTALLINE VOLUME FRACTION; DEVICE CHARACTERISTICS; HYDROGENATED NANOCRYSTALLINE SILICON (NC-SI:H); NANO-CRYSTALLINE SILICON THIN FILMS; PLASMA ENHANCED CHEMICAL VAPOUR DEPOSITIONS (PECVD); SPECTRAL RESPONSE MEASUREMENTS; THIN SOLID FILM;

NANOCRYSTALLINE SILICON;

EID: 79960194059     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2011.05.052     Document Type: Article

References (29)

1. A.V. Shah, J. Meier, E. Vallat-Sauvain, N. Wyrsch, U. Kroll, C. Droz, and U. Graf Sol. Energy Mater. Sol. Cells 78 2003 469
2. M. Kondo, and A. Matsuda Low-temperature fabrication of nanocrystalline-silicon solar cells Y. Hamakawa, Thin-Film Solar Cells 2004 Springer 139
3. S.A. Filonovich, H. Aguas, I. Bernacka-Wojcik, C. Gaspar, M. Vilarigues, L.B. Silva, E. Fortunato, and R. Martins Vacuum 83 2009 1253
4. H. Chen, M.H. Gullanar, and W.Z. Shen J. Cryst. Growth 260 2004 91
5. C.H. Lee, J.W. Jeon, and K.S. Lim J. Appl. Phys. 99 2006 8778
6. T. Fujibayashi, and M. Kondo J. Appl. Phys. 99 2006 043703
7. D.S. Shen, and P.K. Bhat Sol. Energy Mater. Sol. Cells 30 1993 139
8. N. Palit, and P. Chatterjee J. Appl. Phys. 86 1999 6879
9. C. Smit, R.A.C.M.M. van Swaaij, H. Donker, A.M.H.N. Petit, W.M.M. Kessels, and M.C.M. van de Sanden J. Appl. Phys. 94 2003 3582
10. O. Vetterl, M. Hulsbeck, J. Wolff, R. Carius, and F. Finger Thin Solid Films 427 2003 46
11. H. Xia, Y.L. He, L.C. Wang, W. Zhang, X.N. Liu, X.K. Zhang, D. Feng, and H.E. Jackson J. Appl. Phys. 78 1995 6705
12. S. Zhang, X. Liao, Y. Xu, R. Martins, E. Fortunato, and G. Kong J. Non Cryst. Solids 338-340 2004 188
13. E. Bustarret, M.A. Hachicha, and M. Brunel Appl. Phys. Lett. 52 1988 1675
14. A.T. Vautsas, M.K. Hatalis, J.B. Boyce, and A. Chiang J. Appl. Phys. 78 1995 6999
15. R. Saleh, and N.H. Nickel Thin Solids Films 427 2003 266
16. P. Kumar, M. Kupich, D. Grunsky, and B. Schroeder Thin Solids Films 501 2006 260 263
17. H. Buscher, C. Falter, W. Ludwig, K. Zhang, and X. Xie Appl. Phys. Lett. 69 1996 200
18. R. Swanepoel J. Phys. E 16 1983 1214
19. R.T. Philips J. Phys. D: Appl. Phys. 16 1983 489
20. S. Halindintwali, D. Knoesen, T.F.G. Muller, D. Adams, N. Tile, C.C. Theron, and R.E.I. Schropp J. Mater. Sci.: Mater. Electron. 18 2007 225
21. A.H.M. Smets, W.M.M. Kessels, and M.C.M. van de Sanden Appl. Phys. Lett. 82 2003 1547
22. J. Müllerová, P. Šutta, G. van Elzakker, M. Zeman, and M. Mikula Appl. Surf. Sci. 254 2008 3690
23. J. Müllerová, L. Prušáková, M. Netrvalová, V. Vavruňková, and P. Šutta Appl. Surf. Sci. 256 2010 5667
24. C. Delley, and E.F. Steigmeier Phys. Rev. B 47 1993 1397
25. Z. Hu, X. Liao, H. Diao, Y. Cai, S. Zhang, E. Fortunato, and R. Martins J. Non Cryst. Solids 352 2006
26. Y. Vygranenko, A. Sazonov, G. Heiler, T. Tredwell, M. Vieira, and A. Nathan Appl. Phys. Lett. 95 2009 263505
27. J.K. Rath, and R.E.I. Schropp Sol. Energy Mater. Sol. Cells 53 1998 189
28. S.C. Lee J. Appl. Phys. 55 1984 4426
29. S.N. Agbo, J. Krc, R.A.C.M.M. van Swaaij, and M. Zeman Sol. Energy Mater. Sol. Cells 94 2010 1864