Microcrystalline B-doped window layers prepared near amorphous to microcrystalline transition by HWCVD and its application in amorphous silicon solar cells

Thin Solid Films

Volumn 501, Issue 1-2, 2006, Pages 260-263

  Kumar, P ^a   Kupich, M ^a   Grunsky, D ^a   Schroeder, B ^a  

^a University of Koblenz Landau   (Germany)

Author keywords

Hot wire deposition; Microcrystalline p layer; Solar cells

Indexed keywords

BORON COMPOUNDS; CHEMICAL VAPOR DEPOSITION; CRYSTALLINE MATERIALS; DOPING (ADDITIVES); THIN FILMS;

HOT-WIRE DEPOSITION; MICROCRYSTALLINE P-LAYER;

SOLAR CELLS;

EID: 32644449957     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.07.151     Document Type: Conference Paper

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