In situ analysis of elemental depth distributions in thin films by combined evaluation of synchrotron x-ray fluorescence and diffraction

Journal of Applied Physics

Volumn 109, Issue 12, 2011, Pages

  Mainz, R ^a   Klenk, R ^a  

^a HAHN MEITNER INSTITUT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING PROCESS; ARBITRARY FUNCTIONS; DEPTH DISTRIBUTION; DIFFRACTION SIGNALS; ENERGY-DISPERSIVE X-RAY DIFFRACTION; FLUORESCENCE INTENSITIES; FLUORESCENCE SIGNALS; IN-SITU ANALYSIS; NON-UNIFORMITIES; PARAMETERIZED; PHASE INFORMATION; REACTIVE ANNEALING; SECONDARY FLUORESCENCE; SULFUR ATMOSPHERE; SYNCHROTRON X-RAY FLUORESCENCES; SYNTHESIS PROCESS; TIME EVOLUTIONS; TIME-DEPENDENT;

ANNEALING; DIFFRACTION; FLUORESCENCE; SULFUR; SYNCHROTRONS; THIN FILMS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

COPPER;

EID: 79960152753     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3592288     Document Type: Article

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