Fabrication of tunable clamped-clamped microresonators in silicon (1 1 0)

Journal of Micromechanics and Microengineering

Volumn 21, Issue 7, 2011, Pages

  Van Leeuwen, R ^a   Lew, P H R ^a   Van Der Drift, E W J M ^a   Van Der Zant, H S J ^a   Venstra, W J ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

CALCULATED VALUES; DEEP REACTIVE ION ETCHING; ETCH RATES; GATE ELECTRODES; HIGH ASPECT RATIO; MICRO RESONATORS; RESONANCE FREQUENCIES; RESONATOR DIMENSION; SILICON BEAMS; SILICON ON INSULATOR WAFERS; SILICON RESONATORS;

ASPECT RATIO; ELECTRON BEAM LITHOGRAPHY; FABRICATION; NATURAL FREQUENCIES; REACTIVE ION ETCHING; RESONATORS; SEMICONDUCTING SILICON COMPOUNDS; SURFACE ROUGHNESS;

SILICON WAFERS;

EID: 79960049245     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/21/7/075011     Document Type: Article

References (23)

1. Verbridge S V, Craighead H C and Parpia J M 2008 A megahertz nanomechanical resonator with room temperature quality factor over a million Appl. Phys. Lett. 92 013112
2. Huang X M H, Zorman C A, Mehregany M and Roukes M L 2003 Nanodevice motion at microwave frequencies Nature 421 496
3. M Li, Tang H X and Roukes M L 2007 Ultra-sensitive NEMS-based cantilevers for sensing, scanned probe and very high-frequency applications Nature Nanotechnol. 2 114-20 (Pubitemid 46226371)
4. Unterreithmeier Q P, Weig E M and Kotthaus J P 2009 Universal transduction scheme for nanomechanical systems based on dielectric forces Nature 458 1001-4
5. Westra H J R, Poot M, van der Zant H S J and Venstra W J 2010 Nonlinear modal interactions in clamped-clamped mechanical resonators Phys. Rev. Lett. 105 117205
6. M Li, Myers E B, Tang H X, Aldridge S J, McCaig H C, Whiting J J, Simonson R J, Lewis N S and Roukes M L 2010 Nanoelectromechanical resonator arrays for ultrafast, gas-phase chromatographic chemical analysis Nano Lett. 10 3899-903
7. Karabacak D M, Brongersma S H and Crego-Calama M 2010 Enhanced sensitivity volatile detection with low power integrated micromechanical resonators Lab Chip 10 1976-82
8. Venstra W J and van der Zant H S J 2008 Efficient readout of micromechanical resonator arrays in ambient conditions Appl. Phys. Lett. 93 234106
9. Mahboob I and Yamaguchi H 2008 Bit storage and bit flip operations in an electromechanical oscillator Nature Nanotechnol. 3 275-9 (Pubitemid 351668056)
10. Badzey R L, Zolfagharkhani G, Gaidarzhy A and Mohanty P 2004 A controllable nanomechanical memory element Appl. Phys. Lett. 85 3587-9
11. Roodenburg D, Spronck J W, van der Zant H S J and Venstra W J 2009 Buckling beam micromechanical memory with on-chip readout Appl. Phys. Lett. 94 183501
12. Babaei Gavan K, Westra H J R, van der Drift E W J M, Venstra W J and van der Zant H S J 2009 Size-dependent effective Young's modulus of silicon nitride cantilevers Appl. Phys. Lett. 94 233108
13. Babaei Gavan K, Westra H J R, van der Drift E W J M, Venstra W J and Van der Zant H S J 2009 Impact of fabrication technology on flexural resonances of silicon nitride cantilevers Microelectron. Eng. 86 1216-8
14. Babaei Gavan K, van der Drift E W J M, Venstra W J, Zuiddam M R and van der Zant H S J 2009 Effect of undercut on the resonant behaviour of silicon nitride cantilevers J. Micromech. Microeng. 19 035003
15. B Wu, Kumar A and Pamarthy S 2010 High aspect ratio silicon etch: a review J. Appl. Phys. 108 051101
16. Zubel I and Kramkowska M 2005 Possibilities of extension of 3-D shapes by bulk micromachining of different Si (h k l) substrates J. Micromech. Microeng. 15 485-93 (Pubitemid 40402196)
17. Ahn M, Heilmann R K and Schattenburg M L 2007 Fabrication of ultrahigh aspect ratio freestanding gratings on silicon-on-insulator wafers J. Vac. Sci. Technol. B 25 2593-7 (Pubitemid 350255941)
18. Williams K R, Gupta K and Wasilik M 2003 Etch rates for micromachining processing - part II J. Microelectromech. Syst. 12 761-78
19. Morin P, Benoit D and Metz J 2008 Modeling the stress enhancement of plasma enhanced chemical vapor deposited silicon nitride films by UV post treatment - impact of the film density Eur. Phys. J. - Appl. Phys. 43 315-20
20. Venstra W J, Westra H J R, Gavan K B and van der Zant H S J 2009 Magnetomotive drive and detection of clamped-clamped mechanical resonators in water Appl. Phys. Lett. 95 263103
21. Cleland A N 2002 Foundations of Nanomechanics (Berlin: Springer)
22. Hisamoto D, Lee W C, Kedzierski J, Takeuchi H, Asano K, Kuo C, Anderson E, King T J, Bokor J and Hu M C 2000 FinFET - a self-aligned double-gate MOSFET scalable to 20 nm IEEE Trans. Electron Devices 47 2320-5
23. Sunami H, Furukawa T and Masuda T 2004 A three-dimensional MOS transistor formation technique with crystallographic orientation-dependent TMAH etchant Sensors Actuators A 111 310