Properties of pulsed reactive DC magnetron sputtered tantalum oxide (Ta2O5) thin films for photocatalysis

Surface and Coatings Technology

Volumn 205, Issue SUPPL. 2, 2011, Pages

  Kumar, K Jagadeesh ^a   Raju, N Ravi Chandra ^a   Subrahmanyam, A ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY MADRAS   (India)

Author keywords

Photocatalysis; Pulsed sputtering; Rhodamine B; Work function

Indexed keywords

ATOMIC FORCE MICROSCOPY; ENERGY GAP; FILM PREPARATION; MAGNETRON SPUTTERING; OXIDE FILMS; PHOTOCATALYSIS; SURFACE ROUGHNESS; TANTALUM OXIDES; WIDE BAND GAP SEMICONDUCTORS; WORK FUNCTION; X RAY DIFFRACTION;

DIRECT CURRENT MAGNETRON SPUTTERING; HIGH PHOTOCATALYTIC ACTIVITIES; PHOTOCATALYTIC ACTIVITIES; PHOTOCATALYTIC PROPERTY; PULSED SPUTTERING; PULSING FREQUENCIES; RHODAMINE B; SURFACE WORK FUNCTIONS;

THIN FILMS;

EID: 79959790819     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2011.03.052     Document Type: Article

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