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Volumn 33, Issue 6, 2011, Pages 730-738

Metal plasma immersion ion implantation and deposition (MePIIID) on screw-shaped titanium implant: The effects of ion source, ion dose and acceleration voltage on surface chemistry and morphology

Author keywords

Calcium; Magnesium; Metal plasma immersion ion implantation and deposition (MePIIID); Surface chemistry and topography; Titanium implant

Indexed keywords

ACCELERATION VOLTAGES; BIOACTIVE SURFACES; BONE RESPONSE; CATHODIC ARC DEPOSITION; ION DOSE; METAL PLASMA IMMERSION ION IMPLANTATION AND DEPOSITION; METAL PLASMA IMMERSION ION IMPLANTATION AND DEPOSITION (MEPIIID); NANOMETER LEVEL; ORTHOPAEDIC IMPLANTS; PLASMA IMMERSION ION IMPLANTATION; PLASMA ION SOURCE; PROCESS PARAMETERS; SCREW-TYPE TITANIUM IMPLANT; TITANIUM IMPLANT; TITANIUM IMPLANTS;

EID: 79959502557     PISSN: 13504533     EISSN: 18734030     Source Type: Journal    
DOI: 10.1016/j.medengphy.2011.01.011     Document Type: Article
Times cited : (12)

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