Structure and properties of silver-containing a-C(H) films deposited by plasma immersion ion implantation

Surface and Coatings Technology

Volumn 202, Issue 15, 2008, Pages 3675-3682

  Endrino, J L ^a,b   Escobar Galindo, R ^b   Zhang, H S ^c   Allen, M ^d   Gago, R ^b,e   Espinosa, A ^b   Anders, A ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b INSTITUTO DE CIENCIA DE MATERIALES DE MADRID   (Spain)

^c UNIVERSITY OF CALIFORNIA   (United States)

^d SUNY UPSTATE MEDICAL UNIVERSITY   (United States)

^e CENTRO DE MICROANÁLISIS DE MATERIALES   (Spain)

Author keywords

Amorphous carbon; Cell viability; Nanoindentation; Plasma immersion ion implantation; Raman; Silver; X ray absorption spectroscopy

Indexed keywords

AMORPHOUS CARBON; ION IMPLANTATION; MICROSTRUCTURE; NANOINDENTATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILVER; STRUCTURE (COMPOSITION);

CELL VIABILITY; PLASMA IMMERSION ION IMPLANTATION;

INORGANIC COATINGS;

AMORPHOUS CARBON; INORGANIC COATINGS; ION IMPLANTATION; MICROSTRUCTURE; NANOINDENTATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILVER; STRUCTURE (COMPOSITION);

EID: 40949114177     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2008.01.011     Document Type: Article

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