Functionalization of hydrogen-free diamond-like carbon films using open-air dielectric barrier discharge atmospheric plasma treatments

Applied Surface Science

Volumn 254, Issue 17, 2008, Pages 5323-5328

  Endrino, J L ^a,b   Marco, J F ^c   Allen, M ^d   Poolcharuansin, P ^a,e   Phani, A R ^f   Albella, J M ^b   Anders, A ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b INSTITUTO DE CIENCIA DE MATERIALES DE MADRID   (Spain)

^c INSTITUTO DE QUÍMICA FÍSICA ROCASOLANO   (Spain)

^d SUNY UPSTATE MEDICAL UNIVERSITY   (United States)

^e MAHASARAKHAM UNIVERSITY   (Thailand)

^f INFM   (Italy)

Author keywords

Cell viability; DLC; Ion implantation and deposition; Wettability; XPS

Indexed keywords

CONTACT ANGLE; DEPOSITION; DIELECTRIC MATERIALS; INTERFACIAL ENERGY; ION IMPLANTATION; OSTEOBLASTS; PLASMA APPLICATIONS; WETTING; X RAY PHOTOELECTRON SPECTROSCOPY;

CELL VIABILITY; DIELECTRIC BARRIER DISCHARGE; SURFACE BONDS;

DIAMOND LIKE CARBON FILMS;

EID: 43849085955     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.02.065     Document Type: Article

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