Submicrometer pattern fabrication by intensification of instability in ultrathin polymer films under a water-solvent mix

Macromolecules

Volumn 44, Issue 12, 2011, Pages 4928-4935

  Verma, Ankur ^a   Sharma, Ashutosh ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY KANPUR   (India)

Author keywords

[No Author keywords available]

Indexed keywords

DE-WETTING; DROPLET SIZES; HIGH SURFACE ENERGY; LARGE LENGTH-SCALE; LENGTH SCALE; MAGNITUDE REDUCTION; METHYL ETHYL KETONES; OPTIMAL MIXTURES; ORDERED ARRAY; PATTERNED SUBSTRATES; POLYSTYRENE FILMS; ROOM TEMPERATURE; SMALL SCALE; SUB-MICROMETER PATTERNS; SUBMICROMETERS; ULTRA-THIN; ULTRA-THIN POLYMER FILMS; VERSATILE METHODS;

ACETONE; DROPS; GLASS; GLASS TRANSITION; MICROMETERS; ORGANIC SOLVENTS; PLASTIC FILMS; POLYSTYRENES; SOLVENTS; SURFACE CHEMISTRY; ULTRATHIN FILMS; VAN DER WAALS FORCES;

POLYMER FILMS;

EID: 79959459976     PISSN: 00249297     EISSN: None     Source Type: Journal    
DOI: 10.1021/ma200113w     Document Type: Article

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