Thin poly(styrene-block-4-hydroxystyrene) block copolymer films spin-coated directly on topographic prepattern substrates

Macromolecules

Volumn 41, Issue 23, 2008, Pages 9290-9294

  Lee, Geuntak ^a   Jo, Pil Sung ^a   Yoon, Bokyung ^a   Kim, Tae Hee ^a   Acharya, Himadri ^a   Ito, Hiroshi ^b   Kim, Ho Cheol ^b   Huh, June ^c   Park, Cheolmin ^a  

^a Yonsei University   (South Korea)

^b IBM ALMADEN RESEARCH CENTER   (United States)

^c Seoul National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AS CASTS; BLOCK COPOLYMER FILMS; CRITICAL VALUES; DE-WETTING; HYDROXYSTYRENE; NANO STRUCTURES; NON-EQUILIBRIUM STATE; PERIODIC LINES; POLYMER THIN FILMS; SELF-ASSEMBLED; SOLVENT VAPORS; SPIN-COATING;

BLOCK COPOLYMERS; COPOLYMERIZATION; POLYMERS; SPIN DYNAMICS; STYRENE; THIN FILM DEVICES; THIN FILMS;

PLASTIC COATINGS;

EID: 64549105184     PISSN: 00249297     EISSN: None     Source Type: Journal    
DOI: 10.1021/ma801631y     Document Type: Article

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