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Volumn 98, Issue 21, 2011, Pages

Submonolayer barium passivation study for germanium(100)/molecular beam epitaxial Al2 O3

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE VOLTAGE; CONDUCTANCE TECHNIQUES; DESORPTION TEMPERATURES; DOSE-DEPENDENT; FORMING GAS ANNEALING; INTERFACE CHARACTERISTIC; INTERFACE TRAPS; PASSIVATION EFFECT; SUBMONOLAYER; SYMMETRIC DISTRIBUTIONS; THERMALLY STABLE;

EID: 79959420462     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3595685     Document Type: Article
Times cited : (10)

References (17)
  • 4
    • 79959398945 scopus 로고    scopus 로고
    • The International Technology Roadmafor Semiconductors
    • The International Technology Roadmap for Semiconductors, 2009.
    • (2009)
  • 8
    • 0035919629 scopus 로고    scopus 로고
    • Physical structure and inversion charge at a semiconductor interface with a crystalline oxide
    • DOI 10.1126/science.293.5529.468
    • R. A. McKee, F. J. Walker, and M. F. Chisholm, Science 0036-8075 293, 468 (2001). 10.1126/science.293.5529.468 (Pubitemid 32679069)
    • (2001) Science , vol.293 , Issue.5529 , pp. 468-471
    • McKee, R.A.1    Walker, F.J.2    Chisholm, M.F.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.