Role of strontium in oxide epitaxy on silicon (001)

Physical Review Letters

Volumn 101, Issue 10, 2008, Pages

  Reiner, J W ^a   Garrity, K F ^a   Walker, F J ^a   Ismail Beigi, S ^a   Ahn, C H ^a  

^a Yale University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALKALINE EARTH METALS; COMPUTER NETWORKS; CRYSTAL GROWTH; CRYSTALLINE MATERIALS; SILICON; STRONTIUM; SURFACE REACTIONS;

DIFFRACTION STUDIES; SI(001); SI-TECHNOLOGY; SUB MONOLAYERS;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 51649112452     PISSN: 00319007     EISSN: 10797114     Source Type: Journal    
DOI: 10.1103/PhysRevLett.101.105503     Document Type: Article

References (16)

1. R.A. McKee, F.J. Walker, and M.F. Chisholm, Phys. Rev. Lett. 81, 3014 (1998). PRLTAO 0031-9007 10.1103/PhysRevLett.81.3014
2. R.A. McKee, F.J. Walker, M.B. Nardelli, W.A. Shelton, and G.M. Stocks, Science 300, 1726 (2003). SCIEAS 0036-8075 10.1126/science.1083894
3. C.R. Ashman, C.J. Först, K. Schwarz, and P.E. Blöchl, Phys. Rev. B PRBMDO 0163-1829 69, 075309 (2004). 10.1103/PhysRevB.69.075309
4. C.J. Först, C.R. Ashman, K. Schwarz, and P.E. Blöchl, Nature (London) 427, 53 (2004). NATUAS 0028-0836 10.1038/nature02204
5. X. Zhang, A.A. Demkov, H. Li, X. Hu, Y. Wei, and J. Kulik, Phys. Rev. B PRBMDO 0163-1829 68, 125323 (2003). 10.1103/PhysRevB.68.125323
6. J. Lettieri, J.H. Haeni, and D.G. Schlom, J. Vac. Sci. Technol. A 20, 1332 (2002). JVTAD6 0734-2101 10.1116/1.1482710
7. O.L. Alerhand, A.N. Berker, J.D. Joannopoulos, D. Vanderbilt, R.J. Hamers, and J.E. Demuth, Phys. Rev. Lett. 64, 2406 (1990). PRLTAO 0031-9007 10.1103/PhysRevLett.64.2406
8. M.C. Payne, M.P. Teter, D.C. Allen, T.A. Arias, and J.D. Joannopoulos, Rev. Mod. Phys. 64, 1045 (1992). RMPHAT 0034-6861 10.1103/RevModPhys.64.1045
9. G. Henkelman, B.P. Uberuaga, and H. Jonsson, J. Phys. Chem. 113, 9901 (2000). JPCHAX 0022-3654 10.1063/1.1329672
10. O.L. Alerhand, J. Wang, J.D. Joannopoulos, E. Kaxiras, and R.S. Becker, Phys. Rev. B PRBMDO 0163-1829 44, 6534 (1991). 10.1103/PhysRevB.44.6534
11. X. Hu, X. Yao, C.A. Peterson, D. Sarid, Z. Yu, J. Wang, D.S. Marshall, R. Droopad, J.A. Hallmark, and W.J. Ooms, Surf. Sci. 445, 256 (2000); SUSCAS 0039-6028 10.1016/S0039-6028(99)01079-1
12. K. Ojima, M. Yoshimura, and K. Ueda, Surf. Sci. 491, 169 (2001). SUSCAS 0039-6028 10.1016/S0039-6028(01)01392-9
13. A.J. Hoeven, E.J. Van Loenen, D. Dijkkamp, J.M. Lenssinck, and J. Dieleman, Thin Solid Films 183, 263 (1989). THSFAP 0040-6090 10.1016/0040-6090(89)90451-3
14. J. Wang, T.A. Arias, and J.D. Joannopoulos, Phys. Rev. B PRBMDO 0163-1829 47, 10497 (1993). 10.1103/PhysRevB.47.10497
15. A.P. Smith and H. Jonsson, Phys. Rev. Lett. 77, 1326 (1996). PRLTAO 0031-9007 10.1103/PhysRevLett.77.1326
16. A.-B. Posadas, M. Lippma, F. Walker, M. Dawber, C. Ahn, and J.-M. Triscone, in Physics of Ferroelectrics-A Modern Perspective (Springer, New York, 2007), p. 284.