Ion-beam-induced damage formation in CdTe

Journal of Applied Physics

Volumn 109, Issue 11, 2011, Pages

  Rischau, C W ^a   Schnohr, C S ^a   Wendler, E ^a   Wesch, W ^a  

^a FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS LAYER; CDTE; COMPUTER CODES; DAMAGE FORMATION; DEFECT DISTRIBUTION; ELECTRONIC ENERGY LOSS; ENERGY DEPENDENT; HIGH RESISTANCE; IMPLANTED IONS; IN-SITU; IONICITIES; NO FORMATION; PROJECTED RANGE; ROOM TEMPERATURE; THERMAL ORIGINS;

CADMIUM COMPOUNDS; DEFECTS; DIFFRACTIVE OPTICS; ELECTRON ENERGY LOSS SPECTROSCOPY; ENERGY DISSIPATION; IONS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SINGLE CRYSTALS;

CADMIUM ALLOYS;

EID: 79959404627     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3592265     Document Type: Article

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