CD-SAXS measurements using laboratory-based and synchrotron-based instruments

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6922, Issue , 2008, Pages

  Wang, Chengqing ^a   Choi, Kwang Woo ^b   Fu, Wei En ^a   Ho, Derek L ^a   Jones, Ronald L ^a   Soles, Christopher ^a   Lin, Eric K ^a   Wu, Wen Li ^a   Clarke, James S ^b   Bunday, Benjamin ^c  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b INTEL CORPORATION   (United States)

^c SEMATECH   (United States)

Author keywords

CD SAXS; Line edge roughness; Line width roughness; Small angle x ray scattering

Indexed keywords

CD-SAXS; CRITICAL DIMENSION; CROSS SECTION; INCIDENT BEAMS; LINE EDGE ROUGHNESS; LINEWIDTH ROUGHNESS; NONLINEAR LEAST SQUARES; PHOTON FLUX; ROUGHNESS AMPLITUDE; SIDEWALL ANGLES; SMALL ANGLE X-RAY SCATTERING; STRUCTURAL PARAMETER; SUB-50 NM; TEST PATTERN; X RAY BEAM; X-RAY SOURCES;

EXTREME ULTRAVIOLET LITHOGRAPHY; LABORATORIES; LITHOGRAPHY; PROCESS CONTROL; SCATTERING; SYNCHROTRONS; UNITS OF MEASUREMENT; X RAY DIFFRACTION; X RAY SCATTERING;

ROUGHNESS MEASUREMENT;

EID: 79959371400     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.773774     Document Type: Conference Paper

References (9)

1. R. L. Jones, T. Hu, E. K. Lin, W.-L. Wu, R. Kolb, D. M. Casa, P. J. Bolton, G. G. Barclay, Appl. Phys. Lett. 83, 4059 (2003).
2. T. Hu, R. L. Jones, W.-L. Wu, E. K. Lin, Q. Lin, D. Keane, S. Weigand, J. P. Quintana, J. Appl. Phys. 96, 83 (2004).
3. R. L. Jones, T. Hu, C. L. Soles, E. K. Lin, W.-L. Wu, D. M. Casa, A. Mahorowala, Proc. SPIE 5375, 191 (2004).
4. R. L. Jones, W.-L. Wu, C-Q Wang, E. K. Lin, K.-W Choi, B. J. Rice, G. M. Thompson, S. J. Weigand, D. T. Keane, Proc. SPIE 6152, 61520N (2006).
5. C. Wang, R. L. Jones, E. K. Lin, W.-L. Wu and J. Leu, Appl. Phys. Lett., 90, 193122 (2007).
6. C. Wang, R. L. Jones, E. K. Lin, W.-L. Wu, B. J. Rice, K.-W. Choi, G. Thompson, S. J. Weigand, and D. T. Keane, J. Appl. Phys. 102, 024901 (2007).
7. P. Thompson, D. E. Cox and J. B. Hastings, J. Appl. Cryst., 20, 79, (1987).
8. Bunday, B., McCormack, D., Bishop, M., Villarrubia, J., Vladar, A., Dixson, R., Vorburger, T., Orji, N, and Allgair, J. "Determination of Optimal Parameters for CD-SEM Measurement of Line Edge Roughness." Proceedings of the SPIE: Metrology, Inspection, and Process Control for Microlithography XVIII 515-533, (2004).
9. The data in this letter, in the figures, and in the tables are presented along with the standard uncertainty (±) involved in the measurement, where the uncertainty represents one standard deviation from the mean.