Characterization of line edge roughness using CD-SAXS

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6152 I, Issue , 2006, Pages

  Jones, Ronald L ^a   Wu, Wen Li ^a   Wang, Cheng Qing ^a   Lin, Eric K ^a   Choi, Kwang Woo ^a,b   Rice, Bryan J ^b   Thompson, George M ^b   Weigand, Steven J ^c   Keane, Denis T ^c  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b INTEL CORPORATION   (United States)

^c ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

Critical Dimension Metrology; Extreme Ultraviolet Lithography; Line Edge Roughness; Scatterometry

Indexed keywords

CRITICAL DIMENSION METROLOGY; EXTREME ULTRAVIOLET LITHOGRAPHY; LINE EDGE ROUGHNESS; SCATTEROMETRY;

DIFFRACTION; LIGHT TRANSMISSION; MEASUREMENT THEORY; OPTICAL COLLIMATORS; SCANNING ELECTRON MICROSCOPY; SCATTERING; SURFACE ROUGHNESS; X RAY ANALYSIS;

EDGE DETECTION;

EID: 33745597576     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656829     Document Type: Conference Paper

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8. The data in this manuscript are presented with the standard uncertainty (±) from the measurement where the uncertainty represents one standard deviation from the mean.