IntenCD™: Mask critical dimension variation mapping

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7028, Issue , 2008, Pages

  Sagiv, Amir ^a   Polonsky, Netanel ^a   Boiman, Oren ^a   Shoval, Lior ^a   Ben Yishai, Michael ^a   Mangan, Shmoolik ^a  

^a Applied Materials Inc Israel   (Israel)

Author keywords

Aerial imaging; CD variation; Mask inspection

Indexed keywords

CADMIUM; CADMIUM COMPOUNDS; COMPUTER NETWORKS; ERROR ANALYSIS; LITHOGRAPHY; MICROFLUIDICS; PHOTORESISTS; TECHNOLOGY;

AERIAL IMAGING; CD ERRORS; CRITICAL DIMENSION (CD); MASK TECHNOLOGY; NEXT-GENERATION LITHOGRAPHY (NGL); PHOTO MASKING;

PHOTOMASKS;

EID: 45549084578     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.793103     Document Type: Conference Paper

References (7)

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2. C. A. Mack, "Analytic Approach to Understanding the Impact of Mask Errors on Optical Lithography", in Optical Microlithography XIII, C. J. Progler (Ed.), Proc. SPIE 4000, 215-227 (2000)
3. 1 Lithography", in Photomask Technology 2007, R. J. Naber & H. Kawahira (Ed), Proc. SPIE 6730, 67301M (2007)
4. http://www.itrs.net/
5. H.J. Baik et al., "Relationship Between Defect Signal and CD Variation in Aerial Imaging Mask Inspection", in Photomask Japan 2008 : Photomask and NGL Mask Technology XV (2008)
6. A. Sagiv and S. Mangan, "'What You See is What You Print' : Aerial Imaging as an Optimal Discriminator Between Printing and Non-Printing Photomask Defects", Photomask Japan 2008 : Photomask and NGL Mask Technology XV (2008)
7. M. S. Hibbs et al., "Evaluation of Molybdenum Suicide for Use as a 193-nm Phase-Shifting Absorber in Photomask Manufacturing", in 20th Annual BACUS Symposium on Photomask Technology, Grenon & Dao (Eds.), Proc. SPIE 4186, 444-451 (2000)