Development of next generation mask inspection method by using the feature of mask image captured with 199 nm inspection optics

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6349 I, Issue , 2006, Pages

  Tsuji, Yoshitake ^a   Kikuiri, Nobutaka ^a   Murakami, Shingo ^a   Takahara, Kenichi ^a   Isomura, Ikunao ^a   Tamura, Yukio ^a   Yamashita, Kyoji ^a   Hirano, Ryoichi ^a   Tateno, Motonari ^a   Matsumura, Kenichi ^a   Takayama, Naohisa ^a   Usuda, Kinya ^a  

^a Advanced Mask Inspection Technology Inc   (Japan)

Author keywords

Die to database; Die to die; Mask inspection; Phase shift mask; Reflected illumination; Transmitted illumination; Tri tone mask alternating PSM

Indexed keywords

INSPECTION; NANOTECHNOLOGY; OPTICAL ENGINEERING; PHASE SHIFT; REFLECTION;

DIE TO DATABASE INSPECTION; DIE TO DIE INSPECTION; MASK INSPECTION; PHASE SHIFT MASK (PSM); REFLECTED ILLUMINATION; REFLECTION INSPECTION; TRANSMITTED ILLUMINATION; TRI-TONE MASK ALTERNATING PSM;

MASKS;

EID: 33846631947     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.692811     Document Type: Conference Paper

References (5)

1. N.Kikuiri, et al., "Development of Advanced Reticle Inspection Apparatus for hp 65 nm node device and beyond", Proc. SPIE, vol.6283, 62830Y, 2006.
2. Dong-Hoon Chung, et al., "Optical inspection strategy for 65nm and beyond", Digest of Papers Photomask Japan 2004, pp.75-76, Yokohama, April 2004.
3. T. Tojo et al., "Advanced mask inspection optical system (AMOS) using 198.5nm wavelength for 65 nm node (hp) and beyond: system development and initial state D/D inspection performance", Proc. SPIE, vol.5567, pp. 1011-1023, 2004.
4. R. Hirano et al., "Development of simultaneous image acquisition optics with transmitted and reflected light for 45nm (hp) node mask inspection", International Micro-processes and Nanotechnology Conference (MNC2005)
5. "NEC mask reticle inspection system LM7000B", Semiconductor Fab / Equipment /facilities Electronic Journal 2005 PP384-386 (in Japanese)