Morphological behavior of thin polyhedral oligomeric silsesquioxane films at the molecular scale

Journal of Colloid and Interface Science

Volumn 360, Issue 2, 2011, Pages 793-799

  Evmenenko, Guennadi ^a   Stripe, Benjamin ^a   Dutta, Pulak ^a  

^a NORTHWESTERN UNIVERSITY   (United States)

Author keywords

Molecular rearrangement; Polyhedral oligomeric silsesquioxanes; Specular X ray reflectivity; Thin films

Indexed keywords

BI-LAYER; ENERGETIC FACTORS; MOLECULAR MONOLAYER; MOLECULAR REARRANGEMENT; MOLECULAR SCALE; MORPHOLOGICAL BEHAVIOR; ORGANIC CHAINS; POLYHEDRAL OLIGOMERIC SILSESQUIOXANES; RESTRICTED GEOMETRIES; SILICON SURFACES; SPECULAR X-RAY REFLECTIVITIES; STRUCTURAL MORPHOLOGY; SYNCHROTRON X RAYS; TERMINAL EPOXY GROUP; UNIFORM FILMS; VOLATILE SOLVENTS;

DIELECTRIC MATERIALS; MONOLAYERS; MORPHOLOGY; ORGANIC COATINGS; PASSIVATION; REFLECTION; THIN FILMS;

OLIGOMERS;

NANOCOMPOSITE; POLYHEDRAL OLIGOMERIC SILSESQUIOXANE; SILICON; SOLVENT; UNCLASSIFIED DRUG;

ARTICLE; FILM; KINEMATICS; MORPHOLOGY; PRIORITY JOURNAL; SYNCHROTRON RADIATION;

EID: 79958785417     PISSN: 00219797     EISSN: 10957103     Source Type: Journal    
DOI: 10.1016/j.jcis.2011.04.073     Document Type: Article

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