Control of thin liquid film morphology during solvent-assisted film deposition

Langmuir

Volumn 26, Issue 10, 2010, Pages 7126-7132

  Evmenenko, Guennadi ^a   Stripe, Benjamin ^a   Dutta, Pulak ^a  

^a NORTHWESTERN UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONFORMATIONAL PROPERTIES; ELECTROSTATIC INTERACTIONS; ESTER MOIETIES; FILM DEPOSITION; LIQUID MOLECULES; LIQUID/SOLID INTERFACE; OXIDE SURFACE; SILICON SURFACES; SOLVENT INTERACTIONS; STRUCTURAL MORPHOLOGY; SUBSTRATE SURFACE; THIN LIQUID FILM; VOLATILE SOLVENTS;

ADSORPTION; AUTOMOBILE EXHIBITIONS; ESTERIFICATION; ESTERS; LIQUID FILMS; MORPHOLOGY; OXIDE FILMS; PASSIVATION; SILICATES; SILICONES; VAN DER WAALS FORCES;

SOLVENTS;

EID: 77952349874     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la904177p     Document Type: Article

References (40)

1. Churaev, N. V. Colloid J. 1996, 58, 681-693
2. Yu, C.-J., Evmenenko, G., Richter, A. G., Datta, A., Kmetko, J., and Dutta, P. Appl. Surf. Sci. 2001, 182, 231-235
3. Kaplan, W. D. and Kauffmann, Y. Annu. Rev. Mater. Res. 2006, 36, 1-48
4. Evmenenko, G., van der Boom, M. E., Yu, C.-J., Kmetko, J., and Dutta, P. Polymer 2002, 44, 1051-1056
5. Evmenenko, G., Yu, C.-J., Kmetko, J., and Dutta, P. Langmuir 2002, 18, 5468-5472
6. Evmenenko, G., van der Boom, M. E., Yu, C.-J., Kmetko, J., and Dutta, P. Polymer 2003, 44, 1051-1056
7. Doerr, A. K., Tolan, M., Seydel, T., and Press, W. Physica B 1998, 248, 263-268
8. Yu, C.-J., Richter, A. G., Datta, A., Durbin, M. K., and Dutta, P. Phys. Rev. Lett. 1999, 82, 2326-2329
9. Yu, C.-J., Richter, A. G., Kmetko, J., Dugan, S. W., Datta, A., and Dutta, P. Phys. Rev. E 2001, 021205-8
10. Evmenenko, G., Dugan, S. W., Kmetko, J., and Dutta, P. Langmuir 2001, 17, 4021-4024
11. Evmenenko, G., Kewalramani, S., and Dutta, P. Polymer 2007, 48, 7163-7168
12. Fukuzawa, K., Deguchi, T., Yamawaki, Y., Itoh, S., Muramatsu, T., and Zhang, H. Langmuir 2008, 24, 2921-2928
13. Xu, L., Ogletree, D. F., Salmeron, M., Tang, H., Gui, J., and Marchon, B. J. Chem. Phys. 2000, 112, 2952-2957
14. Burtovyy, R. and Luzinov, I. Langmuir 2008, 24, 5903-5910
15. Kim, J.-H., Ahn, S. I., Kim, J. H., Kim, J. S., Cho, K., Jung, J. C., Chang, T., Ree, M., and Zin, W.-C. Langmuir 2008, 24, 11442-11450
16. Wen, K., Maoz, R., Cohen, H., Sagiv, J., Gibaud, A., Desert, A., and Ocko, B. M. ACS Nano 2008, 2, 579-599
17. Sivagurunathan, P., Liakath Ali Khan, F., and Ramachandran, K. Z. Phys. Chem. 2007, 221, 273-280
18. Doyle Abbott, A., Wright, J. R., Goldschmidt, A., Stewart, W. T., and Bolt, R. O. J. Chem. Eng. Data 1961, 6, 437-442
19. Arkles, B. Silicon esters. In Kirk-Othmer Encyclopedia of Chemical Technology, 4 th ed.; John Wiley & Sons, Inc.: Hoboken, NJ, 1997; Vol. 22, pp 69 - 81.
20. Arkles, B. and Larson, G. L. Silicon Compounds: Silanes & Silicones; Gelest Catalog, Gelest, Inc.: Morrisville, PA, 2008.
21. Evmenenko, G., Mo, H., Kewalramani, S., and Dutta, P. Langmuir 2006, 22, 6245-6248
22. Tidswell, I. M., Ocko, B. M., Pershan, P. S., Wasserman, S. R., Whitesides, G. M., and Axe, J. D. Phys. Rev. B 1990, 41, 1111-1128
23. Evmenenko, G., van der Boom, M. E., Kmetko, J., Dugan, S. W., Marks, T. J., and Dutta, P. J. Chem. Phys. 2001, 115, 6722-6727
24. Kiessig, H. Ann. Phys. 1931, 10, 769-788
25. Ocko, B. M., Wu, X. Z., Sirota, E. B., Sinha, S. K., and Deutsch, M. Phys. Rev. Lett. 1994, 72, 242-245
26. Hare, E. F. and Zisman, W. A. J. Phys. Chem. 1955, 55, 335-340
27. de Gennes, P. G. Rev. Mod. Phys. 1985, 57, 827-863
28. Waltman, R. J. Langmuir 2004, 20, 3166-3172
29. Ferreira, P. G., Ajdari, A., and Leibler, L. Macromolecules 1998, 31, 3994-4003
30. Epps, T. H., III, DeLongchamp, M., Fasolka, M. J., Fisher, D. A., and Jablonski, E. L. Langmuir 2007, 23, 3355-3362
31. The monolayer adsorbed on the hydroxylated silicon substrate can not be removed by simple sonication in any solvent. To ensure cleaning/recovery of the silicon substrate surface after TBEES film deposition a sequence of HF and Piranha etching is required.
32. Raghavan, S. R., Walls, H. J., and Khan, S. A. Langmuir 2000, 16, 7920-7930
33. Zhuravlev, L. T. Langmuir 1987, 3, 316-318
34. Okom-Schmidt, H. F. IBM J. Res. Develop. 1999, 43, 351-365
35. Hildebrand, J. H. and Scott, R. L. The Solubility of Nonelectrolytes; Third Ed.; Dover Publications, Inc.: New York, 1964, 488 pp.
36. The detailed study of binary mixtures of hexane and toluene from structural and energetic considerations can be found in: Freire, S., Segade, L., Cabeza, O., and Jiménez, E. J. Chem. Thermodyn. 2007, 39, 621-626
37. Wainfan, N. and Parratt, L. G. J. Appl. Phys. 1960, 31, 1331-1337
38. Sharma, A. Langmuir 1998, 14, 4915-4928
39. Chen, X. and Anthamatten, M. Langmuir 2009, 25, 11555-11562
40. At the present time the layering of liquid molecules at solid-liquid interfaces is well-established result. See, for example, refs 3 and 8-10, and citations therein.