Photoinduced high-quality ultrathin SiO2 film from hybrid nanosheet at room temperature

Journal of the American Chemical Society

Volumn 130, Issue 36, 2008, Pages 11848-11849

  Kim, Yeji ^a   Zhao, Feng ^a   Mitsuishi, Masaya ^a   Watanabe, Akira ^a   Miyashita, Tokuji ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

NANOMATERIAL; SILICON DIOXIDE;

ARTICLE; CHEMICAL STRUCTURE; FILM; IRRADIATION; OXIDATION; TEMPERATURE; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 51749121549     PISSN: 00027863     EISSN: None     Source Type: Journal    
DOI: 10.1021/ja803852w     Document Type: Article

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