Solvent-assisted dewetting during chemical vapor deposition

Langmuir

Volumn 25, Issue 19, 2009, Pages 11555-11562

  Chen, Xichong ^a   Anthamatten, Mitchell ^a  

^a University of Rochester   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AUTOPHOBIC DEWETTING; AXISYMMETRIC; CARRIER GAS; DE-WETTING; DEPOSITION CONDITIONS; GASPHASE; LATERAL LENGTH; LENGTH SCALE; METHYL METHACRYLATES; NON EQUILIBRIUM; OXIDE LAYER; POLAR INTERACTIONS; POLYMER DROPLETS; POLYMER THIN FILMS; POLYMETHYL METHACRYLATE FILMS; RANDOMLY DISTRIBUTED; SILANE COUPLING; SOLVENT VAPORS; SOLVENT-ASSISTED DEWETTING; SOLVENTLESS TECHNIQUE; TERT BUTANOL; TERT-BUTYL PEROXIDE; THIN FILM DEWETTING; WAFER SUBSTRATES; ZONE REACTORS;

BOUNDARY LAYER FLOW; CHEMICAL VAPOR DEPOSITION; DEPOSITION; ESTERS; PHOTORESISTS; PLASTIC FILMS; POLYMER FILMS; POLYMERS; POWER SPECTRAL DENSITY; SEMICONDUCTING SILICON COMPOUNDS; SILANES; SILICON WAFERS; SOLVENTS; THIN FILM DEVICES; THIN FILMS; VAN DER WAALS FORCES; VAPORS;

FILM PREPARATION;

EID: 70349898801     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la901481q     Document Type: Article

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