Modification of AlN thin films morphology and structure by temporally shaping of fs laser pulses used for deposition

Thin Solid Films

Volumn 519, Issue 19, 2011, Pages 6381-6387

  Ristoscu, C ^a   Ghica, C ^b   Papadopoulou, E L ^c   Socol, G ^a   Gray, D ^c   Mironov, B ^b   Mihailescu, I N ^a   Fotakis, C ^c,d  

^a NATIONAL INSTITUTE FOR LASER   (Romania)

^b NATIONAL INSTITUTE OF MATERIALS PHYSICS   (Romania)

^c INSTITUTE OF ELECTRONIC STRUCTURE AND LASER   (Greece)

^d UNIVERSITY OF CRETE   (Greece)

Author keywords

Aluminum nitride; Femto second lasers; Laser pulse shape; Nanostructured thin films; Pulsed laser deposition

Indexed keywords

ALN THIN FILMS; FEMTO-SECOND LASER; FILM MORPHOLOGY; FS LASER PULSE; LASER SOURCES; NANOSTRUCTURED THIN FILM; PULSE-SHAPING; THIN LAYERS; TI-SAPPHIRE;

ALUMINUM COATINGS; ALUMINUM NITRIDE; DEPOSITION; LASER PULSES; MORPHOLOGY; PULSED LASER DEPOSITION; THIN FILMS; TITANIUM NITRIDE; VAPOR DEPOSITION;

PULSED LASERS;

EID: 79958242174     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.04.065     Document Type: Article

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