Effects of pulse laser duration and ambient nitrogen pressure in PLD of AlN

Applied Physics A: Materials Science and Processing

Volumn 79, Issue 4-6, 2004, Pages 927-929

  Ristoscu, C ^a   Gyorgy, E ^a   Mihailescu, I N ^a   Klini, A ^b   Zorba, V ^b   Fotakis, C ^b,c  

^a NATIONAL INSTITUTE FOR LASER   (Romania)

^b INSTITUTE OF ELECTRONIC STRUCTURE AND LASER   (Greece)

^c UNIVERSITY OF CRETE   (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

DECOMPOSITION; DEPOSITION; IRRADIATION; LASER ABLATION; LASER BEAMS; LENSES; MORPHOLOGY; PLASMAS; POSITIVE IONS; PROFILOMETRY; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; STOICHIOMETRY; THIN FILMS; X RAY DIFFRACTION;

GAS PRESSURE; LASER SOURCES; NANOMETERS; VACUUM CHAMBERS;

PULSED LASER DEPOSITION;

EID: 4344671734     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00339-004-2857-x     Document Type: Conference Paper

References (7)

1. R.D. Vispute, J. Narayan, H. Wu, K. Jagannadham: J. Appl. Phys. 77, 4724 (1995)
2. G. Radhakrishan: J. Appl. Phys. 78, 600 (1995)
3. I.N. Mihailescu, E. Gyorgy: Pulsed Laser Deposition: An Overview, 4th International Commission for Optics (ICO) Book International Trends in Optics and Photonics, ed. by T. Asakura (1999) pp. 201-214
4. E. György, C. Ristoscu, I.N. Mihailescu, A. Klini, N. Vainos, C. Fotakis, C. Ghica, G. Schmerber, J. Faerber: J. Appl. Phys. 90, 456 (2001)
5. C. Ristoscu, I.N. Mihailescu, M. Velegrakis, M. Massaouti, A. Klini, C. Fotakis: J. Appl. Phys. 93, 2244 (2003)
6. V. Zorba, A. Klini, E. György, C. Ristoscu, V.S. Teodorescu, I.N. Mihailescu, C. Fotakis: Laser Phys. 13, 1325 (2003)
7. E. György, V.S. Teodorescu, I.N. Mihailescu, A. Klini, V. Zorba, A. Manousaki, C. Fotakis: J. Mat. Res. 19, 820 (2004)