Control of ionization processes in high band gap materials via tailored femtosecond pulses

Optics Express

Volumn 15, Issue 26, 2007, Pages 17855-17862

  Englert, L ^a   Rethfeld, B ^b   Haag, L ^a   Wollenhaupt, M ^a   Sarpe Tudoran, C ^a   Baumert, T ^a  

^a UNIVERSITY OF KASSEL   (Germany)

^b Rheinland Pfälzische Technische Universität Kaiserslautern Landau   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

FUSED SILICA; IONIZATION; LASER APPLICATIONS; SAPPHIRE; ULTRASHORT PULSES;

ELECTRON-ELECTRON IMPACT IONIZATION; INTENSITY SCALES; PULSE DURATION;

ENERGY GAP;

ALUMINUM OXIDE; ION; SILICON DIOXIDE;

ARTICLE; CHEMISTRY; LASER; MATERIALS; MATERIALS TESTING; RADIATION EXPOSURE; SEMICONDUCTOR;

ALUMINUM OXIDE; IONS; LASERS; MANUFACTURED MATERIALS; MATERIALS TESTING; SEMICONDUCTORS; SILICON DIOXIDE;

EID: 37549072307     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.15.017855     Document Type: Article

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