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Journal of Materials Research

Volumn 19, Issue 3, 2004, Pages 820-826

Surface morphology studies of Sub-Ps pulsed-laser-deposited AlN thin films

(7) Gyorgy E a Teodorescu, V S a Mihailescu, I N a Klini, A b Zorba, V b Manousaki, A b Fotakis, C b,c

a INSTITUTE OF ATOMIC PHYSICS (Romania)

b INSTITUTE OF ELECTRONIC STRUCTURE AND LASER (Greece)

c UNIVERSITY OF CRETE (Greece)

Author keywords

In film; Laser ablation; Microstructure

Indexed keywords

ALUMINUM NITRIDE; EXCIMER LASERS; LASER ABLATION; MICROSTRUCTURE; NITROGEN; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; MORPHOLOGY; NANOSTRUCTURED MATERIALS; PULSED LASER DEPOSITION; SURFACES;

ABLATION PLASMA; ALN THIN FILMS; ALUMINUM NITRIDE THIN FILMS; AMBIENT NITROGEN PRESSURES; AVERAGE DIAMETER; DEPOSITED FILMS; FORMATION MECHANISM; SPHERICAL DROPLETS; EXCIMER LASER ABLATION; LOW PRESSURE NITROGEN; NANOMETER;

PULSED LASERS; ALUMINUM NITRIDE; LASER ABLATION;

EID: 1942423272 PISSN: 08842914 EISSN: 20445326 Source Type: Journal
DOI: 10.1557/jmr.2004.19.3.820 Document Type: Article

Times cited : (4)

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