Investigation of element distribution and homogeneity of TXRF samples using SR-micro-XRF to validate the use of an internal standard and improve external standard quantification

Analytical and Bioanalytical Chemistry

Volumn 400, Issue 8, 2011, Pages 2649-2654

  Horntrich, C ^a   Smolek, S ^a   Maderitsch, A ^a   Simon, R ^b   Kregsamer, P ^a   Streli, C ^a  

^a VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

^b KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

Author keywords

External standard; Homogeneity; Internal standard; SR XRF; TXRF

Indexed keywords

ABSORPTION EFFECTS; ANALYSIS OF LIQUIDS; ELEMENT DISTRIBUTION; ELEMENTAL DISTRIBUTION; EXTERNAL STANDARD; FLUORESCENCE INTENSITIES; HOMOGENEITY; INHOMOGENEITIES; INTERNAL STANDARDS; LIGHT MICROSCOPES; LINEAR CALIBRATION; LINEAR RELATION; MICRO X-RAY FLUORESCENCE; MICROSCOPE IMAGES; MULTI-ELEMENT; NANOGRAMS; NON DESTRUCTIVE; OPTICAL MICROSCOPES; QUALITATIVE AND QUANTITATIVE ANALYSIS; SAMPLE SHAPE; SEMICONDUCTOR INDUSTRY; SILICON WAFER SURFACE; SMALL SAMPLES; STATISTICAL ERRORS; STATISTICAL UNCERTAINTY; TOTAL REFLECTION X-RAY FLUORESCENCE ANALYSIS; TXRF; WAFER SURFACE ANALYSIS;

CHEMICALS; FLUORESCENCE; INVESTMENTS; MICROSCOPES; RADIATION EFFECTS; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON WAFERS; STANDARDS; SURFACE ANALYSIS; TRACE ANALYSIS; TRACE ELEMENTS; UNCERTAINTY ANALYSIS; X RAY ANALYSIS;

QUALITY CONTROL;

EID: 79958149398     PISSN: 16182642     EISSN: 16182650     Source Type: Journal    
DOI: 10.1007/s00216-010-4592-9     Document Type: Article

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