Review on grazing incidence X-ray spectrometry and reflectometry

Spectrochimica acta, Part B: Atomic spectroscopy

Volumn 54, Issue 1, 1999, Pages 41-82

  Stoev, Krassimir N ^a   Sakurai, Kenji ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMAGNETIC WAVE REFLECTION; EMISSION SPECTROSCOPY; FLUORESCENCE; INTERFACES (MATERIALS); THIN FILMS; TRACE ANALYSIS; X RAY SCATTERING;

GRAZING INCIDENCE X RAY REFLECTOMETRY; GRAZING INCIDENCE X RAY SPECTROMETRY; TOTAL REFLECTION X RAY FLUORESCENCE (TXRF) SPECTROSCOPY;

X RAY SPECTROSCOPY;

EID: 0033521370     PISSN: 05848547     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0584-8547(98)00160-8     Document Type: Review

References (482)

1. Compton A. Phi. Mag. 45:1923;1121.
2. Yoneda Y. Phys. Rev. 113:1963;2010.
3. Yoneda Y., Horiuchi T. Rev. Sci. Instrum. 42:1971;1069.
4. Lengeler B. Advanced Mater. 2:1990;123.
5. Bowen D., Wormington M. Adv. X-Ray Anal. 36:1993;171.
6. Bowen D., Tanner B. Nanotechnology. 4:1993;175.
7. van den Hoogenhof W., de Boer D.K.G. Spectrochim. Acta, Part B. 48:1993;277.
8. Lengeler B., Huppauff M. Fresenuis J. Anal. Chem. 346:1993;155.
9. van den Hoogenhof W., de Boer D.K.G. Surf. Interface Anal. 22:1994;572.
10. de Boer D.K.G., Leenaers A., van den Hoogenhof W. Appl. Phys. A58:1994;169.
11. de Boer D.K.G., Leenaers A., van den Hoogenhof W. X-Ray Spectrom. 24:1995;91.
12. de Boer D.K.G., Leenaers A. Adv. X-ray Chem. Anal. (Japan). 26:1995;119.
13. Stoev K., Sakurai K. Rigaku J. 14(2):1997;22.
14. Sakurai K., Ortega L. Bunseki. 3:1998;164. in Japanese.
15. Leenaers A.J.G., Vrakking J., de Boer D.K.G. Spectrochim. Acta, Part B. 52:1997;805.
16. Klockenkämper R., Knoth J., Prange A., Schwenke H. Anal. Chem. 64:1992;1115A.
17. Tolg G., Klockenkämper R. Spectrochim. Acta, Part B. 48:1993;111.
18. R.Hockett, Total reflection X-ray fluorescence (TXRF), in: Materials Research Society Symposium Proceedings. Beam-Solid Interactions for Materials Synthesis and Characterization, Nov. 28-Dec. 2, 1994, Boston, USA, p. 377 (Materials Research Society, Pittsburgh, USA).
19. Aiginger H., Wobrauschek P., Streli C. Anal. Sci. 11:1995;471.
20. Sakurai K., Stoev K. Bunseki. 7:1997;575. in Japanese.
21. H. Saisho, Y. Gohshi (Eds.), "Application of Synchrotron Radiation to Material Analysis", Elsevier, Amsterdam, 1996.
22. H.Schwenke, J.Knoth, Total reflection XRF, in: R.E. van Grieken, A.A. Markowicz (Eds.), "Handbook of X-Ray Spectrometry", chap. 9, Marcel Dekker, New York, 1993, p. 464.
23. R. Klockenkämper, "Total Reflection X-ray Fluorescence Analysis", Wiley, New York, 1997.
24. Nakano Y., Fukamachi T., Hayakawa K. Jpn. J. Appl. Phys., Suppl. 17(2):1978;329-331.
25. Bilderback D.H., Hubbard S. Nucl. Instrum. Meth. 195:1982;85-89.
26. Bilderback D.H., Hubbard S. Nucl. Instrum. Meth. 195:1982;91.
27. Bilderback D.H. SPIE Proc. 315:1981;90.
28. Chason E., Warwick D.T. Mater. Res. Soc. Symp. Proc. 208:1991;351.
29. Chason E., Mayer T., Payne A., Wu D. Appl. Phys. Lett. 60:1992;2353.
30. Parratt L.G. Phys. Rev. 95:1954;359.
31. Zhou X., Chen S., Felcher G. Phys. Rev. A. 46:1992;1839.
32. Hamley I., Pedersen J. J. Appl. Crystallogr. 27:1994;29.
33. Lu J., Lee E., Tomas R. Acta Crystallogr. A52:1996;11.
34. Pedersen J., Hamley I. J. Appl. Crystallogr. 27:1994;36.
35. Zhou X., Chen S. Phys. Rep. 257:1995;223.
36. Zhou X., He L. Phys. Rev. E. 49:1994;5345.
37. Manciu M., Dudas L., Suergers C., Manaila R. J. Appl. Crystallogr. 28:1995;160.
38. Campos H. Phys. Scripta. 47:1993;599.
39. Artioukov I., Asadchikov V., Kozhevnikov I. J. X-ray Sci. Technol. 6:1996;223.
40. Spiller E., Segmüller A. Appl. Phys. Lett. 24:1974;60.
41. Feng Y., Deckman H., Sinha S. Appl. Phys. Lett. 64:1994;930.
42. Feng Y., Sinha S., Fullerton E., Grübel G., Abermathy D., Siddons D., Hastings J. Appl. Phys. Lett. 64:1994;930.
43. Zheludeva S., Kovalchuk M., Novikova N., Sosphenov A., Malysheva N., Salashchenko N., Platonov Y., Akhsakhalyan A. Crystallogr. Rep. 40(1):1995;132.
44. J. Pelka, S. Lagomarsino, S. Di Fonzo, W. Jark, J. Domagala, Acta Phys Polonica A, 89, p. 323 (1996).
45. Lagomarsino S., Jark W., Di Fonzo S., Cedola A., Müller B., Riekel C., Engstrom P. J. Appl. Phys. 79:1996;4471.
46. Jark W., Di Fonzo S., Lagomarsino S., Cedola A., di Fabrizio E., Brams A., Riekel C. J. Appl. Phys. 80:1996;4831.
47. Erofeev V., Kavalenko N. J. X-ray Sci. Technol. 7:1997;71.
48. Matveev V.M., Matveev V.V. Physica B. B208:1995;768.
49. Matveev V.M., Matveev V.V. Physica B. B221:1996;408.
50. Safa M., Tanner B.K. J. Magn. Magn. Mater. 150:1995;L290.
51. Spirkl W. J. Appl. Phys. 74:1993;1776.
52. Lee E., Milnes J., Wong I. Physica B. B221:1996;159.
53. Samoilenko I.I., Shchedrin B.M., Feigin L.A. Physica B. B221:1996;542.
54. Sakurai K., Iida A. Adv. X-Ray Anal. 35:1992;813.
55. Sakurai K., Iida A. Jpn. J. Appl. Phys. 31:1992;L113.
56. Bridou F., Pardo B. J. X-Ray Sci. Technol. 4:1994;200.
57. Bridou F., Pardo B. J. Phys. III. 4:1994;1523.
58. Voorma H., Louise E., Koster N., Bijkerk F. J. Appl. Phys. 81(9):1997;6112.
59. Usami K., Suzuki H. J. Magn. Soc. Jpn. 18:1994;38. in Japanese.
60. Rieutord F., Braslau A., Simon R., Lauter H.J., Pasyuk V. Physica B. B221:1996;215-217.
61. Gibaud A., Vignaud G. Acta Crystallogr. A49:1993;642.
62. Klemradt U., Funke M., Fromm M., Lengeler B., Peisl J., Foerster A. Physica B. B221:1996;27-33.
63. Bahr D., Press W., Jebasinski R., Mantl S. Phys. Rev. B. 47(8):1993;4385.
64. Wormington M., Bowen D.K., Tanner B.K. Mat. Res. Soc. Symp. Proc. 238:1992;119.
65. Manual of GIXA v.2.0, BEDE Scientific Instruments Ltd (1995).
66. MUREX,
67. Gabb T.A., Gibson P.N., Roberts K.J. Comput. Phys. Comm. 77:1993;441.
68. K. Stoev, J. Knoth, H. Schwenke, X-ray reflectivity simulation software, The 7th German-Japanese Workshop on Chemical Information, April 10-11, 1997, Nara, Japan.
69. Henke B.L., Gullikson E.M., Davis J.C. Atom. Data Nucl. Data Tables. 54:1993;181-342.
70. Wernisch J., Poehn C., Hanke W., Ebel H. X-Ray Spectrom. 13(4):1984;180.
71. Poehn C., Wernisch J., Hanke W. X-Ray Spectrom. 14(3):1985;120.
72. Wang J., Sagar R., Schmider H., Smith V. Atom. Data Nucl. Data Tables. 53:1993;233-269.
73. Chantler C. J. Phys. Chem. Ref. Data. 24(1):1995;71.
74. Stanglmeier F., Lengeler B., Weber W., Göbel H., Schuster M. Acta Crystallogr. A48:1992;626-639.
75. Bergstrom P.M., Kissel L., Pratt R., Costescu A. Acta Crystallogr. A53:1997;7-14.
76. Croce P., Nevot L. Revue Phys. Appl. 11:1976;113-125.
77. Nevot L., Croce P. Revue Phys. Appl. 15:1980;761-779.
78. Nevot L., Pardo B., Corno J. Revue Phys. Appl. 23:1988;1675-1686.
79. Croce P., Nevot L., Pardo B. Nouv. Rev. Opt. Appl. 3:1972;37-50.
80. Underwood J.H., Barbee T.W. Appl. Opt. 20:1981;3027-3034.
81. de Boer D.K.G. Phys. Rev. B. 49(9):1994;5817.
82. de Boer D.K.G. Phys. Rev. B. 51(8):1995;5297.
83. de Boer D.K.G. Phys. Rev. B. 53(10):1996;6048.
84. Ijdiyaou Y., Hafidi K., Azizan M., Ameziane E.L., Patrat G., Brunel M., Ortega L., Nguyen Tan T.A. Thin Solid Films. 266(2):1995;224-228.
85. Rieutord F., Simon R., Beau B. Physica B. B221:1996;215-217.
86. Asami H., Watanabe Y. Jpn. J. Appl. Phys. 33:1994;L1073-L1076.
87. Han S.W., Pitney J.A., Miceli P.F., Covington M., Greene L.H., Godbole M.J., Lowndes D.H. Physica B. B221:1996;235-237.
88. Wallace W.E., Wu W.L. Appl. Phys. Lett. 67(9):1995;1203.
89. Awaji N., Sugita Y., Ohkubo S., Nakanishi T., Takasaki K., Komiya S. Jpn. J. Appl. Phys. 34:1995;L1013.
90. Awaji N., Ohkubo S., Nakanishi T., Sugita Y., Takasaki K., Komiya S. Jpn. J. Appl. Phys. 35:1996;L67.
91. Gibaud A., Cowley R., McMorrow D., Ward R.C.C., Wells M.R. Phys. Rev. B. 48(9):1993;14463.
92. Wulff H., Klimke J., Gerova E. Surf. Interface Anal. 23(3):1995;148.
93. Filatova E., Stepanov A., Blessing C., Friedrich J., Barchewitz R., Andre J.-M., Le Guern F., Bac S., Troussel P. J. Phys. 7(14):1995;2731.
94. Schmicker D., Hibma T., Edwards K., Howes P., MacDonals J., James M., Breeman M., Barkema G. J. Phys: Condens. Matter. 9:1997;969-980.
95. Powell A.R., Bowen D.K., Wormington M., Kubiak R.A., Parker E.H.C., Hudson J. Semicond. Sci. Technol. 7:1992;627.
96. Baribeau J.-M. J. Appl. Phys. 74(6):1993;3805.
97. P. Boher, J.P. Piel, J.L. Stehle, J. Crystal Growth, 157(1-4), (1995) p.73.
98. Tanner B.K., Hudson J.M. IEEE Trans. Magn. 28(5, pt.2):1992;2736.
99. Jergel M., Majkova E., Luby S. J. Phys. IV (Paris). 3(C8):1993;337.
100. Kojima I., Li B., Fujimoto T., Kim K., Moon D. J. Phys. D: Appl. Phys. 30:1997;2143-2146.
101. Bai H., Jiang E., Wang C., Tian R. J. Phys.: Condens. Matter. 8:1996;8763-8776.
102. Styrkas D.A., Thomas R.K., Sukhorukov A.V. Thin Solid Films. 243(1-2):1994;437.
103. Albrecht H., Gerber T., Kinzel M., Grunze M. J. Phys. IV (Paris). 3(C8):1993;189.
104. Emelyanov Y., Khatko V., Lunevich A., Globa I. Synth. Metals. 61(1-2):1993;195-198.
105. A.P. Kirilyuk, V.N. Bliznyuk, Thin Solid Films, 269(1-2), 90-96 (1995).
106. Bai J., Tomkiewicz M., Montano P.A. Z. Phys. B. 97(3):1995;465.
107. Jiaming B., Fullerton E.E., Montano P.A. Physica B. 221:1996;411-415.
108. Saito M., Matsubara E., Waseda Y. Mater. Trans., JIM. 37(1):1996;39-44.
109. Ohkawa T., Yamagichi Y., Sakata O., Sanyal M.K., Datta A., Benerjee S., Hashizume H. Physica B. B221:1996;416-419.
110. Kato K., Matsubara E., Saito M., Kosaka T., Waseda Y., Inomata K. Mater. Trans., JIM. 36(3):1995;408-412.
111. Vaknin D. Physica B. B221:1996;152-158.
112. Henn G., Stamm M., Poths H., Ruecker M., Rabe J.P. Physica B. B221:1996;174-184.
113. Magnussen O.M., Regan M.J., Kawamoto E.H., Ocko B.M., Pershan P.S., Maskil N., Deutsch M., Lee S., Penanen K., Berman L.E. Physica B. B221:1996;257-260.
114. Sanyal M.K., Sinha S.K., Huang K.G., Ocko B.M. Phys. Rev. Lett. 66(5):1991;628.
115. McClain B.R., Lee D.D., Carvalho B.L., Mochrie S.G.J., Chen S.H., Litster J.D. Phys. Rev. Lett. 72(2):1994;246.
116. Ocko B.M., Wu X.Z., Sirota E.B., Sinha S.K., Deutsch M. Phys. Rev. Lett. 72(2):1994;242.
117. Strzelczyk M., Muller-Buschbaum P., Tolan M., Press W. Phys. Rev. B. 52(23):1995;16869-16876.
118. Sinha S.K. Physica B. 173:1991;25.
119. Zabel H. Appl. Phys. A. A58:1994;159.
120. Russell T.P. Physica B. B221:1996;267-283.
121. Sinha S.K., Sirota E.B., Garoff S., Stanley H.B. Phys. Rev. B. B38(4):1988;2297.
122. B. Mandelbrot, Fractal Geometry of Nature, Treeman, New York, 1982.
123. H.-O. Peitgen, D. Saupe (Eds.), "The Science of Fractal Images", Springer, Berlin, 1988.
124. J. Feder, Fractals, Plenum, New York, 1988.
125. Meakin P. Phys. Rep. 235(4 and 5):1993;189-289.
126. Palasantzas G. Phys. Rev. B. 48(19):1993;14472-14478.
127. Palasantzas G. Phys. Rev. B. 49:1994;10544-10547.
128. Savage D.E., Kleiner J., Schimke N., Phang Y.H., Jankowski T., Jacobs J., Kariotis R., Lagally M.G. J. Appl. Phys. 69(3):1991;1411.
129. Stearns D.G. J. Appl. Phys. 71(9):1992;4286.
130. Spiller E., Stearns D., Krumrey M. J. Appl. Phys. 74(1):1993;107.
131. Kimball J.C., Bittel D. J. Appl. Phys. 74(2):1993;877.
132. Gladyszewski G., Bruynseraede Y. Thin Solid Film. 275:1996;184.
133. Lai B., Yun W.B., Chrzas J., Voccaro P.J. Phys. Rev. B. B46(4):1992;2481.
134. Kaganer V.M., Stepanov S.A., Koehler R. Physica B. 221:1996;34.
135. Kaganer V.M., Stepanov S.A., Koehler R. Phys. Rev. B. 52:1995;163-169.
136. Daillant J., Belorgey O. J. Chem. Phys. 97(8):1992;5824-5836.
137. Pynn R. Phys. Rev. B. 45(2):1992;602.
138. Weber W., Lengeler B. Phys. Rev. B. 46(12):1992;7953.
139. Kopecky M. J. Appl. Phys. 77(6):1995;2380.
140. Holý V., Kubena J., Ohlidal I., Lischka K., Plotz W. Phys. Rev. B. 47(23):1993;15896.
141. Holý V. Appl. Phys. A. A58:1994;173.
142. Holý V., Baumbach T. Phys. Rev. B. 49(15):1994;10668.
143. Holý V., Baumbach T., Bessiere M. J. Phys. D, Appl. Phys. 28(4A):1995;A220-A226.
144. de Boer D.K.G., Leenaers A.J.G. Physica B. 221(1-4):1996;18-26.
145. Schlomka J.P., Tolan M., Schwalowsky L., Seeck O.H., Stettner J., Press W. Phys. Rev. B. 51(4):1995;2311.
146. Schlomka J.P., Fitsimmons M.R., Pynn R., Stettner J., Seeck O.H., Tolan M., Press W. Physica B. 221:1996;44-52.
147. Press W., Tolan M., Stettner J., Seeck O.H., Schlomka J.P., Nitz V., Schwalowsky L., Mueller-Buschbaum P., Bahr D. Physica B. 221:1996;1-9.
148. Wu W.L. J. Chem. Phys. 98(2):1993;1687.
149. Wu W.L. J. Chem. Phys. 101(5):1994;4198.
150. Kozhevnikov I.V., Vinogradov A.V. J. Russian Laser Res. 16(3):1995;229.
151. You H., Huang K.G., Kampwirth R.T. Physica B. 221:1996;77.
152. Feng Y.P., Sinha S.K., Melendres C.A., Lee D.D. Physica B. 221:1996;251.
153. Vignaud G., Gibaud A., Wang J., Sinha S., Daillant J., Grübel G., Gallot Y. J. Phys.: Condens. Mattes. 9:1997;L125-L130.
154. Mochrie S.G.J., Song S., Yoon M., Abernathy D.L., Steohenson G.B. Physica B. 221:1996;105.
155. Holý V., Giannini C., Tapfer L., Marschner T., Stolz W. Phys. Rev. B. 55(15):1997;9960-9968.
156. Tolan M., Press W., Brinkop F., Kotthaus J.P. Phys. Rev. B. 51(4):1995;2239.
157. Tolan M., Vacca G., Wang J., Sinha S.K., Li Z., Rafailovich M.H., Sokolov J., Gibaud A., Lorenz H., Kotthaus J.P. Physica B. 221:1996;53.
158. Dietrich S., Haase A. Phys. Rep. 260:1995;1.
159. Rauscher M., Salditt T., Spohn H. Phys. Rev. B. 52(23):1995;16855.
160. Stoemmer R., Englisch U., Pietsch U., Holý V. Physica B. 221:1996;284.
161. Paniago R., Homma H., Chow P.C., Reichert H., Moss S.C., Barnea Z., Parkin S.S.P., Cookson D. Physica B. 221:1996;10.
162. Kardar M. Physica B. 221:1996;60.
163. Palasantzas G., Krim J. Phys. Rev. B. 48(5):1993;2873.
164. Renaud G. J. Phys. III (Paris). 4(10):1994;1795.
165. Nielsen J.A. Phys. Rep. 246:1994;251.
166. Salditt T., Metzger T.H., Peisl J. Phys. Rep. Lett. 73:1994;2228.
167. Salditt T., Metzger T.H., Peisl J., Goerig G. J. Appl. Phys. 28:1995;A236.
168. Wormington M., Pape I., Hase T., Tanner B., Bowen D. Phil. Mag. Lett. 74:1996;211.
169. Chiarello R., Panella V., Krim J., Thompson C. Phys. Rev. Lett. 67(24):1991;3408-3411.
170. Lied A., Dosch H., Bilgram J.H. Phys. Rev. Lett. 72(22):1994;3554.
171. Kisker D.W., Stephenson G., Tersoff J., Fuoss P., Brennan S. J. Crystal Growth. 163(1-2):1996;54.
172. S.G. Malhotra, Z. Rek, M. Vill, O.P. Karpenko, S.M. Yalisove, J.C. Bilello, Materials Research Society Symposium Proceedingd: Mechanisms of Thin Film Evolution, 9 Nov-3 Dec 1993, Boston, MA, p. 473-478 (Materials Research Society, Pittsburgh, USA).
173. Lairson B.M., Payne A.P., Brennan S., Rensing N.M., Daniels B.J., Clemens B.M. J. Appl. Phys. 78(7):1995;4449.
174. Lütt M., Schlomka J., Tolan M., Stettner J., Seeck O.H., Press W. Phys. Rev. B. 56(7):1997;4085-4091.
175. Gourier C., Daillant J., Braslau A., Alba M., Quinn K., Luzet D., Blot C. Phys. Rev. Lett. 78(16):1997;3157-3160.
176. Shindler J.D., Mol E.A.L., Shalaginov A., de Jeu W.H. Phys. Rev. Lett. 74(5):1995;722-725.
177. Daillant J., Boelorgey O. J. Chem. Phys. 97(8):1992;5837-5843.
178. Salditt T., Lott D., Metzger T.H., Peisl J., Vignaud G., Legrand J.F., Gruebel G., Hoghoi P., Schaerpf O. Physica B. 221:1996;13.
179. Gu T., Goldman A.I., Mao M. Phys. Rev. B. 56(11):1997;6474-6477.
180. Stettner J., Schwalowsky L., Seeck O.H., Tolan M., Press W., Schwarz C., Kanel H.v. Phys. Rev. B. 53(3):1996;1398-1412.
181. Nitz V., Tolan M., Schlomka J., Seek O.H., Stettner J., Press W., Stelzle M., Sackmann E. Phys. Rev. B. 54(7):1996;5038-5050.
182. Gibaud A., Cowlam N., Vignaud G., Richardson T. Phys. Rev. Lett. 74(16):1995;3205-3208.
183. Stömmer R., Pietsch U. J. Phys. D: Appl. Phys. 29:1996;3161-3165.
184. Jenichen B., Stepanov S.A., Brar B., Kroemer H. J. Appl. Phys. 79(1):1996;120.
185. Reimer P., Li J.-H., Yamaguchi Y., Sakata O., Hashizume H., Usami N., Shiraki Y. J. Phys.: Condens. Matter. 9:1997;4521-4533.
186. Cui S.F., Luo G.M., Li M., Mai Z.H., Cui Q., Zhou J.M., Jiang X.M., Zhang W.L. J. Phys.: Condens. Matter. 9:1997;2891-2902.
187. Dosch H., Mailander L., Johnson R.L., Peisl J. Surf. Sci. 279(3):1992;367.
188. Watson G., Gibbs D., Lander G., Matzke H., Gaulin B., Berman L., Ellis W. Physica B. 221:1996;405.
189. Laidler H., Hickey B.J., Hase T.P.A., Tanner B.K., Schad R., Bruynseraede Y. J. Magn. Magn. Mater. 156(1-3):1996;332.
190. MacKay J., Teichert C., Savage D., Lagally M. Phys. Rev. Lett. 77(18):1996;3925-3928.
191. A.Naudon, D.Thiaudiere, Surf. Coatings Technol. 79(1-3), 103.
192. You H., Nagy Z., Huang K. Phys. Rev. Lett. 78(7):1997;1367-1370.
193. Salditt T., Rhan H., Metzger T., Peisl J., Schuster R., Kotthaus J. Z. Phys. B. 96(2):1994;227.
194. Bloch J.M., Sansone M., Rondelez F., Peiffer D.G., Pincus P., Kim M.W., Eisenberger P.M. Phys. Rev. Lett. 54(10):1985;1039.
195. Iida A., Sakurai K., Yoshinaga A., Gohshi Y. Nucl. Instrum. Meth. A. 246:1986;736.
196. Iida A., Sakurai K., Gohshi Y. Adv. X-Ray Anal. 31:1988;487.
197. Bedzyk M.J., Bilderback D.H., Bonmmarino G.M., Caffrey M., Schidkraut J.S. Science. 241:1988;1788-1791.
198. Bedzyk M.J., Bonmmarino G.M., Schidkraut J.S. Phys. Rev. Lett. 62(12):1989;1376-1379.
199. de Boer D.K.G. Spectrochim. Acta, Part B. 46(10):1991;1433.
200. Krol A., Sher C.J., Kao Y.H. Phys. Rev. B. 38:1988;8579.
201. Yun W.B., Bloch J.M. J. Appl. Phys. 68(4):1990;1421.
202. de Boer D.K.G. Phys. Rev. B. 44(2):1991;498.
203. de Boer D.K.G. Spectrochim. Acta, Part B. 46(10):1991;1323.
204. Weisbrod U., Gutschke R., Knoth J., Schwenke H. Appl. Phys. A. 53:1991;449-456.
205. Zheludeva S.I., Kovalchuk M.V., Novikova N.N., Sosphenov A.N. Adv. X-ray Chem. Anal. (Japan). 26s:1995;181.
206. Ladisich W., Rieder R., Wobrauschek P., Aiginger H. Nucl. Instrum. Meth., Sect. A. 330(3):1993;501-506.
207. Rieder R., Ladisich W., Wobrauschek P., Streli C., Kregsamer P. Nucl. Instrum. Meth., Sect. A. 327(2-3):1993;594-599.
208. Wobrauschek P., Kregsamer P., Ladisich W., Rieder R., Streli C. Spectrochim. Acta, Part B. 48(2):1993;143-151.
209. Wobrauschek P., Streli C., Kregsamer P., Ladisich W., Rieder R. J. Trace Microprobe Techniques. 14(1):1996;103-117.
210. Pettersson R.P., Wobrauschek P. Nucl. Instrum. Meth., Sect. A. 355(2-3):1995;665-667.
211. Pettersson R.P., Boman J. Nucl. Instrum. Meth., Sect. A. 371(3):1996;553-559.
212. Egorov A.I., Kabina L.P., Kondurov I.A., Korotkikh E.M., Martynov V.V., Shchebetov A.F., Sushkov P.A. Adv. X-Ray Anal. 35:1992;959.
213. Kondurov I.A., Korotkikh E.M. Adv. X-Ray Anal. 37:1994;595.
214. Korotkikh E.M. Adv. X-Ray Anal. 37:1994;515.
215. Yamada T., Shoji T., Funabashi M., Utaka T., Arai T. Adv. X-Ray Anal. 38:1995;313.
216. Yamada T., Shoji T., Funabashi M., Utaka T., Arai T., Wilson R. Adv. X-Ray Chem. Anal. (Japan). 26s:1995;53.
217. Knoth J., Schneider H., Schwenke H. X-Ray Spectrom. 23:1994;261.
218. Knoth J., Prange A., Schneider H., Schwenke H. Spectrochim. Acta, Part B. 52(7):1997;907.
219. Bernasconi G., Dargie M., Jaib M., Tajani A. X-Ray Spectrom. 26:1997;203.
220. Utaka T., Shoji T., Shimizu K., Arai T., Wilson R. Adv. X-Ray Anal. 37:1994;599.
221. Rieder R., Wobrauschek P., Ladisich W., Streli C., Aiginger H., Garbe S., Gaul G., Knochel A., Lechtenberg F. Nucl. Instrum. Meth., Sect. A. 355(2-3):1995;648-653.
222. Yakushiji K., Ohkawa S., Yoshinaga A., Harada J. Jpn. J. Appl. Phys. 31:1992;2872.
223. Yakushiji K., Ohkawa S., Yoshinaga A., Harada J. Jpn. J. Appl. Phys., Part 1. 32:1993;1191-1196.
224. Yakushiji K., Ohkawa S., Yoshinaga A., Harada J. Jpn. J. Appl. Phys., Part 1. 33(2):1994;1130-1135.
225. Yakushiji K., Ohkawa S., Yoshinaga A., Harada J. Anal. Sci. 11(3):1995;505-510.
226. Yakushiji K., Ohkawa S., Yoshinaga A., Harada J. Adv. X-ray Chem. Anal. (Japan). 26s:1995;73.
227. Yamada T., Arai T. Adv. X-ray Chem. Anal. (Japan). 26:1995;29.
228. Horiuchi T. Spectrochim. Acta, Part B. 48(2):1993;129-136.
229. Horiuchi T., Fukao K., Matsushige K. Jpn. J. Appl. Phys. 26:1987;L1839.
230. Horiuchi T., Matsushige K. Spectrochim. Acta, Part B. 48(2):1993;137.
231. Hayashi K., Horiuchi T., Matsushige K. Adv. X-ray Chem. Anal. (Japan). 26s:1995;125.
232. Ishida K., Horiuchi T., Matsushige K. Adv. X-ray Chem. Anal. (Japan). 26s:1995;157.
233. Wobrauschek P. J. Trace Microprobe Techniques. 13(2):1995;83-96.
234. Görgl R., Wobrauschek P., Kregsamer P., Streli C., Haller M., Knöchel A., Radtke M. X-Ray Spectrom. 26:1997;189.
235. Schwenke H., Bormann R., Knoth J., Prange A. Spectrochim. Acta, Part B. 48(2):1993;293.
236. Streli C., Aiginger H., Wobrauschek P. Spectrochim. Acta, Part B. 48(2):1993;163-170.
237. Streli C., Wobrauschek P., Unfried E., Aiginger H. Nucl. Instrum. Meth., Sect. A. 334(2-3):1993;425-429.
238. Streli C., Wobrauschek P., Aiginger H., Ladisich W., Rieder R. Adv. X-Ray Anal. 37:1994;577.
239. Streli C., Wobrauschek P., Ladisich W., Reider R., Aiginger H. X-Ray Spectrom. 24(3):1995;137-142.
240. Streli C., Wobrauschek P., Randolf G., Rieder R., Ladisich W., Aiginger H. Anal. Sci. 11(3):1995;477-481.
241. Streli C., Wobrauschek P., Randolf G., Rieder R., Ladisich W., Aiginger H. Adv. X-ray Chem. Anal. (Japan). 26s:1995;63.
242. Streli C., Wobrauschek P., Bauer V., Kregsamer P., Görgl R., Pianetta P., Ryon R., Pahlke S., Fabry L. Spectrochim. Acta, Part B. 52(7):1997;861.
243. Holynska B., Ostachowicz B., Ostachowicz J., Ostrowski A., Ptasinski J., Wegrzynek D. J. Trace Microprobe Techniques. 13(2):1995;163-175.
244. Holynska B., Najman J., Ostachowicz B., Ostachowicz J., Trabska J., Wegrzynek D. J. Trace Microprobe Techniques. 14(1):1996;119-130.
245. Cheburkin A.K., Shotyk W. X-Ray Spectrom. 25(4):1996;175-178.
246. Kozono S., Itoh T., Yoshinaga A., Ohkawa S., Yakushiji K. Anal. Sci. 10(3):1994;477-480.
247. Ludewigt B., Rossington C., Kipnis I., Krieger B. IEEE Trans. Nucl. Sci. 43:1996;1442-1445.
248. Y.I. Dudchik, F.F. Komarov, Y.A. Konstantinov, A new application of X-ray waveguides in microfocus X-ray tubes, X-Ray and Ultraviolet Sensors and Applications Conference, 13-14 July 1995, San Diego, CA, SPIE, 2519, 50.
249. J. Knoth, H. Schwenke, P. Eichinger, Calibration of TXRF equipment, Proceedings of the Second International Symposium on Ultra-Clean Processing of Silicon Surfaces (UCPSS '94), 19-21 Sept. 1994, Bruges, Belgium, pp. 107-110 (ACCO, Leuven, Belgium).
250. R.S. Hockett, J.M. Metz, S. Tan, Quantification issues for VPD/TXRF, Proceedings of the Second International Symposium on Ultra-Clean Processing of Silicon Surfaces (UCPSS '94), 19-21 Sept. 1994, Bruges, Belgium, pp. 171-175 (ACCO, Leuven, Belgium).
251. Torcheux L., Degraeve B., Mayeux A., Delamar M. Surf. Interface Anal. 21(3):1994;192-198.
252. Diebold A.C. J. Vacuum Sci. Technol. A. 14:1996;1919-1923.
253. Yakushiji K., Ohkawa S., Yoshinaga A., Harada J. Jpn. J. Appl. Phys., Part 1. 32(10):1993;4750-4751.
254. Ladisich W., Rieder R., Wobrauschek P. X-Ray Spectrom. 23(4):1994;173-177.
255. Ayala R.E., Perez J.F. Adv. X-ray Chem. Anal. (Japan). 26s:1995;25.
256. Wegrzynek D., Holynska B. Spectrochim. Acta, Part B. 52(7):1997;915.
257. Greaves E., Bernasconi G., Wobrauschek P., Streli C. Spectrochim. Acta, Part B. 52(7):1997;923.
258. Powell C.J., Shimizu R. Surf. Interface Anal. 20(4):1993;322.
259. Hockett R.S. Anal. Sci. 11(3):1995;511.
260. Hockett R.S. Adv. X-ray Chem. Anal. (Japan). 26:1995;79.
261. Freimann P., Schmidt D., Neubauerziebarth A. Spectrochim. Acta, Part B. 48(2):1993;193-198.
262. Jacobson D.C., Poate J.M., Higashi G.S., Boone T., Hockett R. Nucl. Instrum. Meth., Sect. B. 74(1-2):1993;281.
263. D.C. Jacobson, J.M. Poate, G.S. Higashi, T. Boone, D.J. Eaglesham, R. Hockett, Materials Research Society Symposium Proceedings: Surface Chemical Cleaning and Passivation for Semiconductor, April 1993, San Francisco, p. 347.
264. Werho D., Gregory R., Schauer S., Liu X., Garney G., Banks J., Knapp J., Doyle B., Diebold A. Spectrochim. Acta, Part B. 52(7):1997;881.
265. Fabry L., Pahlke S., Kotz L., Fresenius J J. Anal. Chem. 354(3):1996;266-270.
266. Fabry L., Pahlke S., Kotz L., Adachi Y., Furukawa S. Adv. X-ray Chem. Anal. (Japan). 26s:1995;19.
267. Mori Y., Shimanoe K., Sakon T. Anal. Sci. 11(3):1995;499-504.
268. Mori Y., Shimanoe K., Sakon T. Adv. X-ray Chem. Anal. (Japan). 26s:1995;69.
269. Mori Y., Shimanoe K. Anal. Sci. 12(1):1996;141-143.
270. Schnieders A., Mollers R., Terhorst M., Cramer H.G., Niehuis E., Benninghoven A. J. Vacuum Sci. Technol. B. 14(4):1996;2712.
271. R.S. Hockett, S. Ikeda, T. Taniguchi, Proceedings of the Second International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, 14-18 Oct. 1992, Phoenix, AZ, pp. 324-337 (Electrochem. Soc., Pennington, USA).
272. He F., Buoso M.C., Burattini E., Fazinic S., Galassini S., Haque A.M.I., Jaksic M., Moschini G. Nucl. Instrum. Meth., Sect. A. 334(1):1993;238.
273. Dixkens J., Fissan H., Dose T. Spectrochim. Acta, Part B. 48(2):1993;231-238.
274. Klockenkämper R., Bayer H., Vonbohlen A., Schmeling M., Klockow D. Anal. Sci. 11(3):1995;495-498.
275. Bayer H., Vonbohlen A., Klockenkämper R., Klockow D. Mikrochim. Acta. 119(1-2):1995;167-176.
276. Prange A., Kramer K., Reus U. Spectrochim. Acta, Part B. 48(2):1993;153-161.
277. Fan Q.A., Gohshi Y. Appl. Spectrosc. 47(11):1993;1742.
278. Krause P., Erbsloh B., Niedergesass R., Pepelnik R. Fresenius J. Anal. Chem. 353(1):1995;3.
279. Holynska B., Ostachowicz B., Wegrzynek D. Spectrochim. Acta, Part B. 51(7):1996;769-773.
280. Bredendiek-Kaemper S., von Bohlen A., Klockenkämper R., Quentmeier A., Klockow D. J. Anal. Atom. Spectrom. 11:1996;537-541.
281. R.S. Hockett, Proceedings of the Second Symposium on Defects in Silicon. Defects in Silicon II, 5-10 May 1991, Washington, DC, p. 57 (Electrochem. Soc., Pennington, USA).
282. Diebold A., Doris B. Surf. Interface Anal. 20(2):1993;127.
283. Berneike W. Spectrochim. Acta, Part B. 48(2):1993;269-275.
284. Ryssel H., Frey L., Streckfuss N., Schork R., Kroninger F. Appl. Surf. Sci. 63(1-4):1993;79-87.
285. Hockett R.S. Adv. X-Ray Anal. 37:1994;565.
286. L.A. Files, T. Orent, M. Hammerbacher, J. Arch, J. Butterbaugh, Proceedings of the Symposium on Diagnostic Techniques for Semiconductor Materials and Devices, 10-12 Oct. 1994, Miami Beach, FL, p. 322 (Electrochem. Soc., Pennington, USA).
287. W.W. Abadeer, A. LeBlanc, A. Kluwe, P. Schulz, R. Vollertsen, V. Penka, S. Nadahara, A. Antreasyan, D. Cote, W. Cote, M. Levy, H. Akatsu, R. Ludeke, Materials Research Society Symposium Proceedings: Ultraclean Semiconductor Processing Technology and Surface Chemical Cleaning and Passivation. 17-19 April 1995, San Francisco, CA, p. 261.
288. Lavoie M.A., Adams E.D., Miles G.L. J. Vacuum Sci. Technol. A. A14(3):1996;1924.
289. Funabashi M., Utaka T., Arai T. Spectrochim. Acta, Part B. 52(7):1997;887.
290. S.E. Beck, A.G. Gilicinski, IEEE/SEMI 1995 Advanced Semiconductor Manufacturing Conference and Workshop, ASMC '95 Proceedings, 13-15 Nov. 1995, Cambridge, MA, pp. 68-75 (IEEE, New York, USA).
291. O.J. Anttila, M.V. Tilli, Proceedings of the Second International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, 14-18 Oct. 1992, Phoenix, AZ, pp. 179-186 (Electrochem. Soc., Pennington, USA).
292. Ohmi T., Imaoka T., Kezuka T., Takano J., Kogure M. J. Electrochem. Soc. 140(3):1993;811-818.
293. Sees J.A., Hall L.H. Texas Instrum. Tech. J. 11(5):1994;54-63.
294. Sees J.A., Hall L.H. J. Electrochem. Soc. 142(4):1995;1238-1241.
295. Mizokami Y., Ajioka T., Terada N. IEEE Trans. Semiconductor Manufact. 7(4):1994;447.
296. J. Hyeongtag, C. Hyungbok Y.S. Choi; K.K. Ryoo, S.D. Jung, Materials Research Society Symposium Proceedings: Ultraclean Semiconductor Processing Technology and Surface Chemical Cleaning and Passivation, 17-19 April 1995, San Francisco, CA, pp. 297-302.
297. P. Karn, A. Genis, C. Jacobs, L.P. Allen, Proceedings of the Symposium on Diagnostic Techniques for Semiconductor Materials and Devices, 10-12 Oct. 1994, Miami Beach, FL, p. 370.
298. E. Hsu, H.G. Parks, R. Craigin, S. Tomooka, J.S. Ramberg, R.K. Lowry, Proceedings of the Second International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, 14-18 Oct. 1992, Phoenix, AZ, p. 170 (Electrochem. Soc., Pennington, USA).
299. Kroninger F., Streckfuss N., Frey L., Falter T., Ryzlewicz C., Pfitzner L., Ryssel H. Appl. Surf. Sci. 63(1-4):1993;93-98.
300. R.S. Hockett, Proceedings of the Second International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, 14-18 Oct. 1992, Phoenix, AZ, p. 350 (Electrochem. Soc., Pennington, USA).
301. Ishigami S., Ishii S., Shinyashiki H., Furuya H., Shingyouji T. Jpn. J. Appl. Phys., Part 1. 33(4A):1994;1728-1734.
302. Torcheux L., Mayeux A., Chemla M. J. Electrochem. Soc. 142(6):1995;2037-2046.
303. R.S. Hockett, D. Hymes, Materials Research Society Symposium Proceedings: Chemical Surface Preparation, Passivation and Cleaning for Semiconductor Growth and Processing Symposium, 27-29 April 1992, San Francisco, CA, p.173.
304. M. Weling, C. Gabriel, Proceedings of the Symposium on Diagnostic Techniques for Semiconductor Materials and Devices, 10-12 Oct. 1994, Miami Beach, FL, p. 143 (Electrochem. Soc., Pennington, USA).
305. R.S. Hockett, X.C. Mu, Ma Li-Jia, Proceedings of the Second International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, 14-18 Oct. 1992, Phoenix, AZ, p. 358 (Electrochem. Soc., Pennington, USA).
306. Downey D.F., Angel G.C. Nucl. Instrum. Meth., Sect. B. 96(1-2):1995;68-74.
307. Verdonck P., Hasenack C.M., Mansano R.D. J. Vacuum Sci. Technol. B. 14(1):1996;538.
308. H. Shibaya, H. Kondo, K. Tomizawa, Materials Research Society Symposium Proceedings: Chemical Surface Preparation, Passivation and Cleaning for Semiconductor Growth and Processing Symposium, 27-29 April 1992, San Francisco, CA, p. 329.
309. Shibaya H. Jpn. J. Appl. Phys., Part 2. 34(8):1995;L962.
310. B. Witowski, J. Chacon, V. Menon, Proceedings of the Second International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, 14-18 Oct. 1992, Phoenix, AZ, p. 372 (Electrochem. Soc., Pennington, USA).
311. Tsuchiya N., Matsushita Y. Adv. X-ray Chem. Anal. (Japan). 26:1995;85.
312. Klockenkämper R., von Bohlen A. X-Ray Spectrom. 25(4):1996;156-162.
313. Pepelnik R., Erbsloh B., Michaelis W., Prange A. Spectrochim. Acta, Part B. 48(2):1993;223-229.
314. Prange A., Boddeker H., Kramer K. Spectrochim. Acta, Part B. 48(2):1993;207-215.
315. Reus U., Markert B., Hoffmeister C., Spott D., Guhr H. Fresenius J. Anal. Chem. 347(10):1993;430-435.
316. Battiston G.A., Gerbasi R., Degetto S., Sbrignadello G. Spectrochim. Acta, Part B. 48(2):1993;217-221.
317. Miesbauer H. Spectrochim. Acta, Part B. 52(7):1997;1003.
318. Schmidt D., Gerwinski W., Radke I. Spectrochim. Acta, Part B. 48(2):1993;171.
319. Haarich M., Schmidt D., Freimann P., Jacobsen A. Spectrochim. Acta, Part B. 48(2):1993;183.
320. Haffer E., Schmidt D., Freimann P., Gerwinski W. Spectrochim. Acta, Part B. 52(7):1997;935.
321. Arena L.E., Sanchez H.J., Nasello O. Nucl. Instrum. Meth., Sect. B. 100(1):1995;196.
322. Stahlschmidt T., Schultz M., Dannecker W. Spectrochim. Acta, Part B. 52(7):1997;995.
323. Valkovic V., Dargie M., Jaksic M., Markowicz A., Tajani A., Valkovic O. Nucl. Instrum. Meth., Sect. B. 113(1-4):1996;363-367.
324. Klockenkämper R., Bayer H., von Bohlen A. Adv. X-ray Chem. Anal. (Japan). 26s:1995;41.
325. Schmeling M., Klockenkämper R., Klockow D. Spectrochim. Acta, Part B. 52(7):1997;985.
326. Injuk J., Van Grieken R. Spectrochim. Acta, Part B. 50(14):1995;1787.
327. Injuk J., Van Grieken R., Klockenkämper R., von Bohlen A., Kump P. Spectrochim. Acta, Part B. 52(7):1997;977.
328. Greaves E., Sosa J., Sajo-Bohus L., alvarez M., Wobrauschek P., Streli C. Spectrochim. Acta, Part B. 52(7):1997;945.
329. Ebert M., Dahmen J., Hoffmann P., Orther H. Spectrochim. Acta, Part B. 52(7):1997;967.
330. Einax J., Geiss S., Michaelis W. Fresenius J. Anal. Chem. 350(10-11):1994;614-619.
331. Valkovic V., Bernasconi G., Haselberger N., Makarewicz M., Ogris R., Moschini G., Bogdanovic I., Jaksic M., Valkovic O. Nucl. Instrum. Meth., Sect. B. B75(1-4):1993;155-159.
332. Gunther K., Vonbohlen A., Waldner H. Freshwater Biol. 345(7):1993;533-536.
333. Krivan V., Schneider G., Baumann H., Reus U. Fresenius J. Anal. Chem. 348(3):1994;218-225.
334. Gunther K., Vonbohlen A., Strompen C. Anal. Chim. Acta. 309(1-3):1995;327-332.
335. Gonzalez V.M., Amoochoa P., Perez J.M., Fuertes M.A., Masaguer J.R., Navarroranninger C., Alonso C. J. Inorg. Biochem. 63(1):1996;57-68.
336. Wagner M., Rostam-Khani P., Wittershagen A., Rittmeyer C., Kolbesen B., Hoffmann H. Spectrochim. Acta, Part B. 52(7):1997;961.
337. Kump P., Necemer M., Snajder J. Spectrochim. Acta, Part B. 51(5):1996;499-507.
338. Greaves E.D., Meitin J., Sajo-Bohus L., Castelli C., Liendo J., Borgerg C. Adv. X-ray Chem. Anal. (Japan). 26s:1995;47.
339. Carvalho M.L., Barreiros M.A., Costa M.M., Ramos M.T., Marques M.I. X-Ray Spectrom. 25(1):1996;29-32.
340. Aster B., von Bohlen A., Burba P. Spectrochim. Acta, Part B. 52(7):1997;1009.
341. Friese K., Mages M., Wendt-Potthoff K., Neu T. Spectrochim. Acta, Part B. 52(7):1997;1019.
342. Varga A., Zaray G., Fodor F., Cseh E. Spectrochim. Acta, Part B. 52(7):1997;1027.
343. Wittershagen A., Rostam-Khani P., Klimmek O., Groß R., Zickermann V., Gemainhardt S., Kröger A., Ludwig B., Kolbesen B. Spectrochim. Acta, Part B. 52(7):1997;1033.
344. Benninghoff L., Czarnowski D., Denkhaus E., Lemke K. Spectrochim. Acta, Part B. 52(7):1997;1039.
345. von Czarnowski D., Denkhaus E., Lemke K. Spectrochim. Acta, Part B. 52(7):1997;1047.
346. Roberts T.A., Gray K.E. MRS Bull. 20(5):1995;43.
347. Ohtani K., Ohmi T., Ihara K. J. Electrochem. Soc. 140(8):1993;2244-2249.
348. K. Ohtani, K. Ihara, T. Ohmi, Study on adhesion and removal of metallic impurities on PFA surface, Proceedings of the Symposium on Contamination Control and Defect Reduction in Semiconductor Manufacturing I, 12-14 Oct. 1992, Toronto, Ontario, p. 361 (Electrochem. Soc., Pennington, USA).
349. R.S. Hockett, J.M. Metz, Materials Research Society Symposium Proceedings: Flat Panel Display Materials, 5-6 April 1994, San Francisco, CA, p. 223.
350. Tolg G. Anal. Chim. Acta. 283(1):1993;3-18.
351. Schirmacher M., Freimann P., Schmidt D., Dahlmann G. Spectrochim. Acta, Part B. 48(2):1993;199-205.
352. Ojeda N., Greaves E.D., Alvarado J., Sajobohus L. Spectrochim. Acta, Part B. 48(2):1993;247.
353. Vilhunen J., A von Bohlen M., Schmeling M, Klockenkamper R, Klockow D Spectrochim. Acta, Part B. 52(7):1997;953.
354. Freiburg C., Krumpen W., Troppenz U. Spectrochim. Acta, Part B. 48(2):1993;263-267.
355. Klockenkämper R., von Bohlen A., Moens L., Devos W. Spectrochim. Acta B. 48(2):1993;239-246.
356. Moens L., Devos W., Klockenkämper R., von Bohlen A. Trends Anal. Chem. 13(5):1994;198-205.
357. Moens L., Devos W., Klockenkämper R., von Bohlen A. J. Trace Microprobe Techniques. 13(2):1995;119-139.
358. von Bohlen A., Mayer F. Spectrochim. Acta, Part B. 52(7):1997;1053.
359. Wegstein M., Urban H., Rostam-Khani P., Wittershagen A., Kolbesen B. Spectrochim. Acta, Part B. 52(7):1997;1057.
360. Prange A., Reus U., Boddeker H., Fischer R., Adolf F.P. Anal. Sci. 11(3):1995;483-487.
361. Prange A., Reus U., Boddeker H., Fischer R., Adolf F.P. Adv. X-Ray Chem. Anal. (Japan). 26s:1995;1.
362. Ninomiya T., Nomura S., Taniguchi K., Ikeda S. Anal. Sci. 11(3):1995;489-494.
363. Ninomiya T., Nomura S., Taniguchi K., Ikeda S. Adv. X-Ray Chem. Anal. (Japan). 26s:1995;9.
364. Hegde R.I., Tobin J., Fiordalice R.W., Travis E.O. J. Vacuum Sci. Technol. A. 11(4/2):1993;1692.
365. Lieser K.H., Flakowski M., Hoffmann P. Fresenius J. Anal. Chem. 350(3):1994;135-138.
366. Pepelnik R., Prange A., Niedergesass R. J. Anal. Atom. Spectrom. 9(9):1994;1071-1074.
367. Calaway W.F., Coon S.R., Pellin M.J., Gruen D.M., Gordon M., Diebold A.C., Maillot P., Banks J. C., Knapp J. A. Surf. Interface Anal. 21(2):1994;131-137.
368. Diebold A.C. J. Vacuum Sci. Technol. B. 12(4):1994;2768-2778.
369. Santos M.T., Arizmendi L., Bravo D., Dieguez E. Mater. Res. Bull. 31(4):1996;389-396.
370. J. Michel, M.R. Black, G.J. Norga, K.A. Black, H. M'saad, L.C. Kimerling, , SPIE, 2638, 256, Proceedings of Optical Characterization Techniques for High-performance Microelectronic Device Manufacturing II, 25-26 Oct. 1995, Austin, TX (SPIE, USA) Int. Soc. Opt. Eng.
371. Tabe M. J. Inst. Elec. Inf. Comm. Engrs. 77(6):1994;643.
372. Gambino V., Moccia G., Girolami E., Alfonsetti R. Adv. X-ray Chem. Anal. (Japan). 26s:1995;35.
373. Hayashi K., Horiuchi T., Matsushige K. Jpn. J. Appl. Phys., Part 1. 34(12A):1995;6478-6482.
374. Z.H. Ming, A. Krol, Y.L. Soo, Y.H. Kao, J.S. Park, K.L. Wang, Materials Research Society Symposium Proceedings: Evolution of Surface and Thin Film Microstructure,30 Nov-4 Dec 1992, Boston, MA, pp. 261-264.
375. Huppauff M., Lengeler B. J. Appl. Phys. 75(2):1994;785-791.
376. S.M. Baumann, C.J. Hitzman, I.C. Ivanov, A.Y. Craig, P.M. Lindley, Materials Research Society Symposium Proceedings: Science, Technology and Manufacturability Symposium, 4-8 April 1994, San Francisco, CA, p. 675.
377. Zheludeva S.I., Kovalchuk M.V., Novikova N.N., Sosphenov A.N., Malysheva N.E., Salashenko N.N., Akhsakhalyan A.D., Platonov Y.Y., Cernik R.I., Collins S.P. Thin Solid Films. 259(2):1995;131.
378. Cotler T.J., Forster J., Barnes M., Kocon W. J. Electrochem. Soc. 141(11):1994;3218-3221.
379. Wildhagen D., Krivan V. J. Anal. Atom. Spectrom. 11(5):1996;371-377.
380. Frost M.R., Harrington W.L., Downey D.F., Walther S.R. J. Vacuum Sci. Technol. B. 14(1):1996;329-335.
381. Sinner T., Hoffmann P., Ortner H.M. Spectrochim. Acta, Part B. 48(2):1993;255-261.
382. Ketata K., Masmoudi M., Ketata M., Debrie R. Mater. Sci. Engng B. 33(2-3):1995;L1-L5.
383. Mainka G., Metz S., Martin A., Fester A., Rostam-Khani P., Schemmel E., Berneike W., Kolbesen B.O. Adv. X-ray Chem. Anal. (Japan). 26s:1995;57.
384. Hub W., Amphlett H. Fresenius J. Anal. Chem. 350(10-11):1994;587-592.
385. Schwenke H., Gutschke R., Knoth J., Koch M. Appl. Phys. A. 54:1992;460.
386. Fan Q.M., Liu Y.W., Li D.L., Wei C.L. Freshwater Biol. 345(7):1993;518.
387. Kunii Y. Jpn. J. Appl. Phys., Part 1. 32(3):1993;1279-1284.
388. Knoth J., Bormann R., Gutschke R., Michaelsen C., Schwenke H. Spectrochim. Acta, Part B. 48(2):1993;285.
389. Schwenke H., Knoth J. Anal. Sci. 11(3):1995;533-537.
390. Schwenke H., Knoth J. Adv. X-ray Chem. Anal. (Japan). 26:1995;137.
391. Mori Y., Uemura K., Shimanoe K. Spectrochim. Acta, Part B. 52(7):1997;823.
392. Mori Y., Shimanoe K. Anal. Sci. 12(2):1996;277-279.
393. Fan Q.M., Liu Y.W., Wei C.L. Fresenius J. Anal. Chem. 354(2):1996;193.
394. van den Hoogenhof W.W., Ryan T.W. J. Magn. Magn. Mater. 121(1-3):1993;88-93.
395. Kuksenova L.I., Rybakova L.M. Indus. Lab. 61(11):1995;674.
396. Tsuji K., Yamada T., Utaka T., Hirokawa K. J. Appl. Phys. 78(2):1995;969.
397. Wiener G., Michaelsen C., Knoth J., Schwenke H., Bormann R. Rev. Sci. Instrum. 66(1):1995;20.
398. Frank W., Thomas H.J., Schindler A. Spectrochim. Acta, Part B. 50(3):1995;265-270.
399. Günther R., Wiener G., Knoth J., Schwenke H., Bormann R. Rev. Sci. Instrum. 67(6):1996;2332.
400. Schwenke H., Knoth J., Günther R., Wiener G., Bormann R. Spectrochim. Acta, Part B. 52(7):1997;795.
401. Wiener G., Günther R., Michaelsen C., Knoth J., Schwenke H., Bormann R. Spectrochim. Acta, Part B. 52(7):1997;813.
402. Leenaers A.J.G., G de Boer D.K. X-Ray Spectrom. 26:1997;115.
403. Huang T.C., Nozieres J.P., Sperious V.S., Lefakis H., Gurney B.A. Appl. Phys. Lett. 60(13):1992;1573-1575.
404. Huang T., Lee W. Adv. X-ray Chem. Anal. (Japan). 26s:1995;129.
405. Huang T., Lee W. Anal. Sci. 11:1995;529.
406. Kamakura T., Sugamoto J., Tsuchiya N., Matsushita Y. Adv. X-ray Chem. Anal. (Japan). 26s:1995;169.
407. Vis R.D. Nucl. Instrum. Meth., Sect. B. 75(1-4):1993;547.
408. Lechtenberg F., Garbe S., Bauch J., Dingwell D.B., Freitag J., Haller M., Hansteen T.H., Ippach P., Knochel A., Radtke M., Romano C., Sachs P.M., Schmincke H.U., Ullrich H.J. J. Trace Microprobe Techniques. 14(3):1996;561-587.
409. Brennan S., Tompkins W., Takaura N., Pianetta P., Laderman S.S., Fischercolbrie A., Kortright J.B., Madden M.C., Wherry D.C. Nucl. Instrum. Meth., Sect. A. 347(1-3):1994;417-421.
410. Pianetta P., Takaura N., Brennan S., Tompkins W., Laderman S.S., Fischercolbrie A., Shimazaki A., Miyazaki K., Madden M., Wherry D.C., Kortright J.B. Rev. Sci. Instrum. 66(2):1995;1293.
411. Wobrauschek P., Kregsamer P., Ladisich W., Streli C., Pahlke S., Fabry L., Garbe S., Haller M., Knochel A., Radtke M. Nucl. Instrum. Meth., Sect. A. 363(3):1995;619-620.
412. Hegedus F., Wobrauschek P., Sommer W.F., Ryon R.W., Streli C., Winkler P., Ferguson P., Kregsamer P., Rieder R., Victoria M., Horsewell A. X-Ray Spectrom. 22(4):1993;277.
413. Hegedus F., Wobrauschek P., Streli C., Winkler P., Rieder R., Ladisich W., Victoria M., Ryon R.W., Sommer W.F. X-Ray Spectrom. 24(5):1995;253.
414. Liu K.Y., Kojima S., Kudo Y., Kawado S., Iida A. Adv. X-ray Chem. Anal. (Japan). 26:1995;107.
415. A. Fischer-Colbrie, S.S. Laderman, S. Brennan, N. Takaura, P. Pianetta, A. Shimazaki, K. Miyazaki, J. Kortright, D.C. Wherry, Ultra-trace metal analysis of Si wafer surfaces using synchrotron radiation, Proceedings of the Second International Symposium on Ultra-clean Processing of Silicon Surfaces (UCPSS '94), 19-21 Sept. 1994, Bruges, Belgium, pp. 57-60 (ACCO, Leuven, Belgium).
416. Laderman S.S., Fischer-Colbrie A., Shimazaki A., Miyazaki K., Brennan S., Takakura N., Pianetta P., Kortright J.B. Anal. Sci. 11(3):1995;515-518.
417. Laderman S.S., Fischer-Colbrie A., Shimazaki A., Miyazaki K., Brennan S., Takakura N., Pianetta P., Kortright J.B. Adv. X-ray Chem. Anal. (Japan). 26:1995;91.
418. Wobrauschek P., Görgl R., Kresamer P., Streli C., Pahlke S., Fabry L., Haller M., Knöchel A., Radtke M. Spectrochim. Acta, Part B. 52(7):1997;901.
419. Streli C., Wobrauschek P., Ladisich W., Rieder R., Aiginger H., Ryon R.W., Pianetta P. Nucl. Instrum. Meth., Sect. A. 345(2):1994;399-403.
420. Streli C. J. Trace Microprobe Techniques. 13(2):1995;109-117.
421. Takakura N., Brennan S., Pianetta P., Laderman S.S., Fischer-Colbrie A., Kortright J.B., Wherry D.C., Miyazaki K., Shimazaki A. Adv. X-ray Chem. Anal. (Japan). 26s:1995;113.
422. Ortega L., Comin F., Formoso V., Stierle A. J. Synchrotron Rad. 5:1998;1064-1066.
423. Sakurai K., Uehara S., Goto S. J. Synchrotron Rad. 5:1998;554-556.
424. K. Sakurai, K. Stoev, A versatile X-ray spectro-reflectometer for a nano-scale characterization of surfaces and thin films, Proceeding of the workshop on the Nanometer Scale Methods in X-ray Technology NSMXT '97, Oct.6-9, 1997, Costa da Caparica, Portugal.
425. Becker R.S., Golovchenko J.A., Patel J.R. Phys. Rev. Lett. 50(3):1983;153.
426. Suzuki Y., Hasegawa S. Jpn. J. Appl. Phys., Part 1. 32(7):1993;3261-3262.
427. Noma T., Iida A., Sakurai K. Phys. Rev. B. 48(23):1993;17524.
428. Urbach H.P., de Bokx P.K. Anal. Sci. 11(3):1995;549-552.
429. Urbach H.P., de Bokx P.K. Adv. X-Ray Chem. Anal. (Japan). 26:1995;199.
430. Urbach H.P., de Bokx P.K. Phys. Rev. B. 53(7):1996;3752-3763.
431. de Bokx P.K., Kok C., Bailleul A., Wienwr G., Urbach H.P. Spectrochim. Acta, Part B. 52(7):1997;829.
432. de Bokx P.K., Urbach H.P. Rev. Sci. Instrum. 66(1, pt.1):1995;15-19.
433. Claes M., de Bokx P.K., Willard N., Veny P., van Grieken R. Spectrochim. Acta, Part B. 52(7):1997;1063.
434. Claes M., van Grieken R., de Bokx P. X-Ray Spectrom. 26:1997;153.
435. Sasaki Y., Suzuki Y., Tomioka Y., Fukuhara A. Phys. Rev. B. 48(10):1993;7724.
436. Sasaki Y., Suzuki Y., Ishibashi T. Science. 263:1994;62.
437. Sasaki Y. Adv. X-Ray Chem. Anal. (Japan). 26s:1995;193.
438. Noma T., Iida A. Rev. Sci. Instrum. 65(4):1994;837-844.
439. Salditt T., Rhan H., Metzger T., Peisl J., Schuster R., Kotthaus J. Z. Phys. B. 96(2):1994;227.
440. Yamanaka T., Endo A., Ino S. Surf. Sci. 294(1-2):1993;53-66.
441. Yonemitsu K., Shibata N. Jpn. J. Appl. Phys., Part 2. 33(6A):1994;L813-L816.
442. Tsuji K., Wagatsuma K., Hirokawa K., Yamada T., Utaka T. Spectrochim. Acta, Part B. 52(7):1997;841.
443. Martens G., Rabe P. Phys. Stat. Sol(a). 58:1980;415.
444. Heald S.M., Chen H., Tranquada J.M. Phys. Rev. B. 38:1988;1016.
445. Kawai J., Hayakawa S., Kitajima Y., Gohshi Y. Anal. Sci. 11:1995;519.
446. Kawai J., Hayakawa S., Kitajima Y., Gohshi Y. Adv. X-Ray Chem. Anal. (Japan). 26s:1995;97.
447. Borthen P., Strehblow H.-H. Phys. Rev. B. 52(5):1995;3017-3019.
448. Smith A.D., Roper M.D., Padmore H.A. Nucl. Instrum. Meth., Sect. B. 97(1-4):1995;579-584.
449. Palkin A., Ponomarev Y., Savelev A., Salashchenko N. Tech. Phys. 40(6):1996;609-614.
450. Shirai M., Nomura M., Asakura K., Iwasawa Y. Rev. Sci. Instrum. 66(12):1995;5493.
451. Zhan X., Hayakawa S., Zheng S., Gohshi Y. Adv. X-Ray Chem. Anal. (Japan). 26s:1995;103.
452. Kawai J., Adachi H., Hayakawa S., Zheng S., Kobayashi K., Gohshi Y., Maeda K., Kitajima Y. Spectrochim. Acta, Part B. 49(7):1994;739-743.
453. Kawai J., Hayakawa S., Esaka F., Zheng S., Kitajima Y., Maeda K., Adachi H., Gohshi Y., Furuya K. Anal. Chem. 67(9):1995;1526.
454. Kawai J., Hayakawa S., Zheng S., Kitajima Y., Adachi H., Gohshi Y., Esaka F., Furuya K. Physica B. 208/209:1995;237.
455. Watanabe I., Tanida H. Adv. X-Ray Chem. Anal. (Japan). 26:1995;163.
456. Watanabe I., Tanida H. Anal. Sci. (Japan). 11:1995;525.
457. Sakurai K., Iida A. Adv. X-Ray Anal. 33:1990;205.
458. Chester M.J., Jach T. Phys. Rev. B. 48(23):1993;17262.
459. Chester M.J., Jach T., Thurgate S. J. Vacuum Sci. Technol. B. 11(4):1993;1609-1613.
460. Jach T., Chester M.J., Thurgate S.M. Nucl. Instrum. Meth., Sect. A. 347(1-3):1994;507-509.
461. Jach T., Chester M.J., Thurgate S.M. Rev. Sci. Instrum. 65(2):1994;339-342.
462. Kawai J., Kawato S., Hayashi K., Horiuchi T., Matsushige K., Kitajima Y. Appl. Phys. Lett. 67(26):1995;3889-3891.
463. Kawai J., Amano H., Hayashi K., Horiuchi T., Matsushige K., Kitajima Y. Spectrochim. Acta, Part B. 52(7):1997;873.
464. Kawai J., Hayakawa S., Kitajima Y., Maeda K., Gohshi Y. J. Elec. Spectrosc. Related Phenomena. 76:1996;313-318.
465. Hayashi K., Kawato S., Horiuchi T., Matsushige K., Kitajima Y., Takenaka H., Kawai J. Appl. Phys. Lett. 68(14):1996;1921-1923.
466. Kawai J., Hayakawa S., Suzuki S., Kitajima Y., Takata Y., Urai T., Meaeda K., Fujinami M., Hashiguchi Y., Gohshi Y. Appl. Phys. Lett. 63(2):1993;269.
467. Tsuji K., Hirokawa K. Rev. Sci. Instrum. 67(10):1996;3573.
468. van Kan J.A., Vis R.D. Nucl. Instrum. Meth., Sect. B. 109/110:1996;85-93.
469. van Kan J.A., Vis R.D. Nucl. Instrum. Meth., Sect. B. 113(1-4):1996;373-377.
470. van Kan J.A., Vis R.D. Spectrochim. Acta, Part B. 52(7):1997;847.
471. Irkaev S.M., Andreeva M.A., Semenov V.G., Belozerskii G.N., Grishin O.V. Nucl. Instrum. Meth. B74:1993;545.
472. Irkaev S.M., Andreeva M.A., Semenov V.G., Belozerskii G.N., Grishin O.V. Nucl. Instrum. Meth. B74:1993;554.
473. Irkaev S., Andreeva M., Semenov V., Belozerskii G., Grishin O. Nucl. Instrum. Meth. B103(3):1995;351.
474. Belyakov V.A., Aivazian Y. Nucl. Instrum. Meth. A282:1989;628.
475. Belyakov V.A., Zhadenov I.V. Phys. Lett. A189:1994;248.
476. Belyakov V.A., Zhadenov I.V. Nucl. Instrum. Meth. A359:1995;195.
477. Ino S. Adv. X-Ray Chem. Anal. (Japan). 26s:1995;187.
478. Liu Z., Ogota S., Morishita T. Jpn. J. Appl. Phys. 35(10 pt 1):1996;5553.
479. Shimizu S., Yamamuro K., Fuwa K., Yanagida H., Yamakawa H. Thin Solid Films. 228(1-2):1993;18-22.
480. S. Ogota, N. Futaki, Z. Liu, Y. Kanke, T. Morishita, Materials Research Society Symposium Proceedings: Epitaxial Oxide Thin Films II, 26-30 Nov. 1995, Boston, MA, pp. 399-404.
481. Yamanaka T., Ino S. Surf. Sci. 330(2):1995;126-134.