Effect of the substrate on the properties of ZnO-MgO thin films grown by atmospheric pressure metal-organic chemical vapor deposition

Thin Solid Films

Volumn 519, Issue 18, 2011, Pages 6044-6052

  Torres Huerta, A M ^a   Dominguez Crespo M A ^a   Brachetti Sibaja, S B ^a   Arenas Alatorre, J ^b   Rodriguez Pulido A ^c  

^a INSTITUTO POLITÉCNICO NACIONAL   (Mexico)

^b UNIVERSIDAD NACIONAL AUTÓNOMA DE MÉXICO   (Mexico)

^c Unidad Profesional' Adolfo López Mateos'   (Mexico)

Author keywords

Atmospheric pressure metalorganic chemical vapor deposition; Ellipsometry; Magnesium oxide; Optical properties; Surface morphology; Thin films; Zinc oxide

Indexed keywords

ACETYLACETONATES; ATMOSPHERIC-PRESSURE METALORGANIC CHEMICAL VAPOR DEPOSITION; DEPOSITION PARAMETERS; DISPERSION MODELS; DRUDE OSCILLATORS; INTERSTITIAL SITES; LORENTZ; LOW DEPOSITION TEMPERATURE; METAL-ORGANIC; METALLIC SUBSTRATE; OPTICAL PARAMETER; OXIDE MIXTURES; THICKNESS OF THE FILM; X RAY REFLECTIVITY; ZNO;

ATMOSPHERIC CHEMISTRY; ATMOSPHERIC PRESSURE; ATMOSPHERICS; DEPOSITION; DISPLAY DEVICES; INDUSTRIAL CHEMICALS; INTERMETALLICS; MAGNESIUM; METALLORGANIC CHEMICAL VAPOR DEPOSITION; OPTICAL PROPERTIES; ORGANIC CHEMICALS; OXIDE FILMS; PRESSURE EFFECTS; SPECTROSCOPIC ELLIPSOMETRY; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION; ZINC; ZINC OXIDE;

VAPOR DEPOSITION;

EID: 79958087243     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.03.030     Document Type: Article

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