Surface textured molybdenum doped zinc oxide thin films prepared for thin film solar cells using pulsed direct current magnetron sputtering

Thin Solid Films

Volumn 519, Issue 16, 2011, Pages 5571-5576

  Lin, Y C ^a   Wang, B L ^a   Yen, W T ^a   Shen, C H ^a  

^a NATIONAL CHANGHUA UNIVERSITY OF EDUCATION   (Taiwan)

Author keywords

Haze value; Light trapping structure; Molybdenum doped zinc oxide; Pulsed direct current magnetron sputtering; Surface textured

Indexed keywords

DOPED ZINC OXIDE THIN FILMS; ELECTRICAL PROPERTY; ETCHING SOLUTIONS; HAZE VALUE; LIGHT TRAPPING STRUCTURE; MO CONTENT; PULSED DIRECT CURRENT; PULSED FREQUENCY; SPUTTERING POWER; SURFACE TEXTURES; THIN FILM SOLAR CELLS; THIN FILM SURFACES; VISIBLE LIGHT; WORKING PRESSURES; ZNO;

ELECTRIC PROPERTIES; ETCHING; HYDROCHLORIC ACID; MAGNETRON SPUTTERING; MOLYBDENUM; MOLYBDENUM OXIDE; OXIDE FILMS; THIN FILMS; ZINC; ZINC OXIDE;

FILM PREPARATION;

EID: 79957999887     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.03.014     Document Type: Article

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