Study on light scattering of rf sputtered ZnO:AI thin films as a front electrode of amorphous silicon thin film solar cells

Conference Record of the IEEE Photovoltaic Specialists Conference

Volumn , Issue , 2009, Pages 000660-000663

  Cho, Jun Sik ^a   Kim, Young Jin ^a   Lee, Jeong Chul ^a   Park, Sang Hyun ^a   Jang, Ji Hoon ^a   Song, Jinsoo ^a   Yoon, Kyung Hoon ^a  

^a Korea Institute of Energy Research (KIER)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON THIN FILMS; ANALYTICAL METHOD; DEPOSITED FILMS; DEPOSITION PARAMETERS; DILUTE ACIDS; DOPED ZNO; ELECTRICAL RESISTIVITY; ETCHING PROCESS; ETCHING TIME; FILM DEPOSITION; GLASS SUBSTRATES; MATERIAL PROPERTY; OPTICAL SCATTERING; OPTICAL TRANSMITTANCE; RF-MAGNETRON SPUTTERING; SUBSTRATE TEMPERATURE; SURFACE TEXTURES; TEXTURED FILMS; TEXTURED SURFACE; VISIBLE-WAVELENGTH RANGE; WORKING PRESSURES; ZNO;

AMORPHOUS FILMS; AMORPHOUS SILICON; ANGULAR DISTRIBUTION; DISTRIBUTION FUNCTIONS; ELECTRIC CONDUCTIVITY; ETCHING; LIGHT SCATTERING; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; REFRACTION; SCATTERING; SCATTERING PARAMETERS; SEMICONDUCTING SILICON COMPOUNDS; SOLAR CELLS; SUBSTRATES; THIN FILMS; ZINC OXIDE;

OPTICAL FILMS;

EID: 77951572892     PISSN: 01608371     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/PVSC.2009.5411591     Document Type: Conference Paper

References (8)

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