Phase retrieval from defocused images and its applications in lithography

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 12 SUPPL. B, 1997, Pages 7494-7498

  Von Bunau, Rudolf M ^a,b   Fukuda, Hiroshi ^a   Terasawa, Tsunco ^a  

^a HITACHI LTD   (Japan)

^b CARL ZEISS SMT AG   (Germany)

Author keywords

Aberration; Defocus; Image; Optical lithography; Phase retrieval method; Phase shifting mask; Projection optics; Pupil plane

Indexed keywords

ABERRATIONS; ALGORITHMS; FOCUSING; IMAGE RECONSTRUCTION; LENSES; MASKS; MICROSCOPIC EXAMINATION; OPTICAL SYSTEMS; OPTICAL VARIABLES MEASUREMENT; OPTICS;

DEFOCUS IMAGES; MICROLITHOGRAPHY SIMULATION MICROSCOPES; PHASE RETRIEVAL METHOD; PHASE SHIFTING MASKS; PROJECTION OPTICS;

PHOTOLITHOGRAPHY;

EID: 0031346366     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.7494     Document Type: Article

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