Tin DPP Source Collector Module (SoCoMo) ready for integration into beta scanner

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7969, Issue , 2011, Pages

  Yoshioka, Masaki ^a   Teramoto, Yusuke ^b   Jonkers, Jeroen ^a   Schürmann, Max C ^a   Apetz, Rolf ^a   Kilian, Volker ^a   Corthout, Marc ^a  

^a XTREME Technologies GmbH   (Germany)

^b Extreme Ultra Violet Lithography System Development Association   (Japan)

Author keywords

EUV lithography; EUV sources; gas discharge produced plasma; Tin

Indexed keywords

ALPHA SOURCES; CRITICAL DIMENSION; DEBRIS MITIGATION; DISCHARGE PLASMA; EFFICIENCY IMPROVEMENT; ENGINEERING CHALLENGES; ENTIRE SYSTEM; EUV LIGHT SOURCES; EUV LITHOGRAPHY; EUV SOURCE; EXPOSURE TOOL; EXTREME ULTRAVIOLETS; FUTURE GENERATIONS; GAS DISCHARGE PRODUCED PLASMA; HIGH VOLUME MANUFACTURING; HIGH-POWER; LASER-ASSISTED; MOORE'S LAW; POWER INCREASE; POWER LEVELS; PRE-PRODUCTION; PRINTING CAPABILITIES; RECENT STATUS; ROADMAP; SEMI STANDARD; SOURCE SYSTEMS; THERMAL SCALING; TRADITIONAL TECHNIQUES;

DEBRIS; ELECTRIC DISCHARGES; EXTREME ULTRAVIOLET LITHOGRAPHY; INTEGRATION; LIGHT SOURCES; LITHOGRAPHY; MANUFACTURE; PLASMA THEORY; SEMICONDUCTOR LASERS; SILICON WAFERS; TIN; ULTRAVIOLET DEVICES; XENON;

SCANNING;

EID: 79957955603     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.879386     Document Type: Conference Paper

References (8)

1. Tin DPP Source Collector Module (SoCoMo):Status of Beta products and HVM developments, Masaki Yoshioka, Yusuke Teramoto, Peter Zink, Guido Schriever, Gota Niimi, Marc Corthout, Proceedings of the SPIE 7636-35 (2010)
2. J. Jonkers, Plasma Sources Sci, Technol. 15 S8 (2006)
3. J. Pankert, et al., Proc. of SPIE 6151, 61510Q (2006)
4. Development of debris-mitigation tool for HVM DPP source, Hironobu Yabuta, Yuki Joshima, Yusuke Teramoto, Hiroto Sato, Kazuaki Hotta, Proceedings of the SPIE 7969-101 (2011), this conference
5. Enabling the 22-nm node via grazing incidence collectors integrated into the DPP source for EUVL HVM, Giovanni Bianucci, Attilio Bragheri, Gian Luca Cassol, Riccardo Ghislanzoni, Ruben Mazzoleni, Tony Tryba, Fabio E. Zocchi, Proceedings of the SPIE 7969-10 (2011), this conference
6. Sn DPP SoCoMo Integration, Marc Corthout, Masaki Yoshioka, and Teams, EUVL Symposium, October 2009, Prague, Czech Republic (2009)
7. Sn film and ignition control for performance enhancement of laser-triggered DPP source, Yusuke Teramoto, Gota Niimi, Takuma Yokoyama, Hideyuki Urakami, Hiroto Sato, Kazuaki Hotta, Proceedings of the SPIE 7969-103 (2011), this conference
8. Performance validation of ASML's NXE:3100, Christian Wagner, Noreen Harned, Erik Loopstra, Hans Meiling, David C. Ockwell, Rudy Peeters, Eelco van Setten, Judon M. D. Stoeldraijer, Stuart Young, John D. Zimmerman, Ivo de Jong, Stef Hendriks, Ron Kool, Martin Lowisch, Jose Bacelar, Proceedings of the SPIE 7969-49 (2011), this conference