Sn film and ignition control for performance enhancement of laser-triggered DPP source

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7969, Issue , 2011, Pages

  Teramoto, Yusuke ^a   Yokoyama, Takuma ^a   Urakami, Hideyuki ^a   Hotta, Kazuaki ^a  

^a Germany Branch   (Germany)

Author keywords

EUV; HVM; laser triggered DPP; Sn

Indexed keywords

ACTIVE CONTROL; COLLECTOR LIFETIME; COOLING MEDIUM; EUV; FAST IONS; HVM; IGNITION CONTROL; LASER-TRIGGERED DPP; PERFORMANCE ENHANCEMENTS; SN; TIN LAYERS;

DEBRIS; IGNITION; LITHOGRAPHY; ULTRAVIOLET LASERS;

TIN;

EID: 79957955599     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.879512     Document Type: Conference Paper

References (3)

1. M. Corthout, Y. Teramoto, M. Yoshioka, et al, "First Tin Beta SoCoMo ready for Wafer Exposure," Presented at 2010 EUVL Symposium, Kobe, Japan, October 2010
2. A. Miyake, H. Kanazawa, B. Noordam, K. Suzuki, Presented at International SEMATECH EUV Source Workshop, Bolton Landing, NY, USA, May 2008
3. S. Wurm, Presented at International SEMATECH EUV Source Workshop, Bolton Landing, NY, USA, May 2008