Development of debris-mitigation tool for HVM DPP source

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7969, Issue , 2011, Pages

  Yabuta, Hironobu ^a   Mori, Shinsuke ^a   Inoue, Takahiro ^a   Teramoto, Yusuke ^a   Sato, Hiroto ^a   Hotta, Kazuaki ^a  

^a Extreme Ultra Violet Lithography System Development Association   (Japan)

Author keywords

debris mitigation; DMT; DPP; EUV

Indexed keywords

ALPHA SOURCES; COLLECTION ANGLE; DEBRIS-MITIGATION; DISCHARGE SOURCE; DMT; DPP; EUV; OPTICAL TRANSMISSIONS;

LIGHT TRANSMISSION;

DEBRIS;

EID: 79957964253     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.879471     Document Type: Conference Paper

References (4)

1. S. Mori, T. Inoue, H. Yabuta, K. Bessho, H. Sato and K. Hotta, "Development of evaluation tool and method for mirrors-mask degradation of EUV exposure tool optics by contaminations from SoCoMo," Presented at 2010 EUVL Symposium, Kobe, Japan, (October 2010).
2. B.L. Henke, E.M. Gullikson, and J.C. Davis, "X-ray interactions: photo absorption, scattering, transmission, and reflection at E=50-30000 eV, Z=1-92," Atomic Data and Nuclear Data Tables Vol. 54 (no.2), 181-342 (July 1993).
3. M. H. L. van der Velden, W. J. M. Brok and J. J. A. M. van der Mullen, "Kinetic simulation of an extreme ultraviolet radiation driven plasma near a multilayer mirror," J. Appl. Phys. Vol. 100, 073303 (2006).
4. M. H. L. van der Velden, V. Y. Banine, B. M. Mertens, J. H. J. Moors, M. Weiss, B. T. Wolschrijn and M. D. Nijkerk, "Lithographic apparatus, szstem and device manufacturing method," Patent No. US 7491951 B2 (2009).