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Volumn 50, Issue 5 PART 2, 2011, Pages

Characterization of local strain around through-silicon via interconnects by using X-ray microdiffraction

(7) Nakatsuka, Osamu a Kitada, Hideki b Kim, Youngsuk b Mizushima, Yoriko c Nakamura, Tomoji c Ohba, Takayuki b Zaima, Shigeaki a

a NAGOYA UNIVERSITY (Japan)

b UNIVERSITY OF TOKYO (Japan)

c FUJITSU LABORATORIES LTD (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPIC STRAIN; IN-PLANE; LOCAL STRAINS; MICRODIFFRACTIONS; OUT-OF-PLANE; SI LAYER; STRAIN STRUCTURE; SUBMICROMETERS; SYNCHROTRON RADIATION SOURCE; X RAY MICRODIFFRACTION;

DIFFRACTION; QUANTUM OPTICS; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SILICON WAFERS; X RAY DIFFRACTION;

STRAIN;

EID: 79957501619 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.50.05ED03 Document Type: Article

Times cited : (21)

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