Local strain in SiGe/Si heterostructures analyzed by X-ray microdiffraction

Thin Solid Films

Volumn 508, Issue 1-2, 2006, Pages 128-131

  Mochizuki, Shogo ^a   Sakai, Akira ^a   Taoka, Noriyuki ^a   Nakatsuka, Osamu ^a   Takeda, Shingo ^b   Kimura, Shigeru ^b,c   Ogawa, Masaki ^a   Zaima, Shigeaki ^a  

^a NAGOYA UNIVERSITY   (Japan)

^b JAPAN SYNCHROTRON RADIATION RESEARCH INSTITUTE   (Japan)

^c JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

High resolution X ray diffraction; SiGe; Strain; X ray microbeam

Indexed keywords

CRYSTAL STRUCTURE; DISLOCATIONS (CRYSTALS); HETEROJUNCTIONS; STRAIN; X RAY DIFFRACTION ANALYSIS;

HIGH RESOLUTION X-RAY DIFFRACTION; SIGE; X-RAY MICROBEAMS; X-RAY MICRODIFFRACTION ANALYSIS;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 33748674423     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.08.417     Document Type: Article

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