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Volumn 62, Issue 2-3, 2001, Pages 279-291

Dry etching-based silicon micro-machining for MEMS

(1) Rangelow, Ivo W a

a UNIVERSITY OF KASSEL (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROOPTICAL EFFECTS; MICROELECTROMECHANICAL DEVICES; PLASMA ETCHING; SEMICONDUCTING SILICON; SINGLE CRYSTALS;

SINGLE CRYSTAL SILICON;

MICROMACHINING;

EID: 0035876169 PISSN: 0042207X EISSN: None Source Type: Journal
DOI: 10.1016/S0042-207X(00)00442-5 Document Type: Article

Times cited : (65)

References (16)

1
- 0004765514
- Deep etching of silicon Publisher Politechnica, ISBN83-7085-254-8
- (1996)
- Rangelow, I.W.¹

2
- 0018469799
- (1979) J Appl Phys , vol.50 , pp. 3189-3194
- Coburn, J.W.¹ Winters, H.F.²

3
- 0019562973
- (1981) J Appl Phys , vol.52 , pp. 3633-3638
- Flamm, D.L.¹ Donnelly, V.M.² Mucha, J.A.³

4
- 0004765704
- 30 September-5 October, Santa Clara, CA, USA. Bellingham, MA: SPIE
- (1990) Proceedings of the Microelectronic Processing Integration , vol.1392 , pp. 77-83
- Fichelscher, A.¹ Rangelow, I.W.² Stamm, A.³

5
- 0004795205
- 30 September-5 October, Santa Clara, CA, USA. Bellingham, MA: SPIE
- (1990) Proceedings of the Microelectronic Processing Integration , vol.1392 , pp. 180-184
- Rangelow, I.W.¹

6
- 0031074309
- (1997) Microelectron Engng , vol.35 , pp. 79-82
- Rangelow, I.W.¹ Paul, A.K.²

7
- 0029779784
- (1995) Microelectron Engng , vol.30 , pp. 447-450
- Leuschner, R.¹ Günther, E.² Falk, G.³ Hammerschmidt, A.⁴ Kragler, K.⁵ Rangelow, I.W.⁶ Zimmermann, J.⁷

8
- 0000413432
- (1997) J Vac Sci Technol B , vol.15 , Issue.6 , pp. 2550-2554
- Hudek, P.¹ Kostic, I.² Belov, M.³ Rangelow, I.W.⁴ Shi, F.⁵ Pawlowski, G.⁶ Spiess, W.⁷ Buschbeck, H.⁸ Cekan, E.⁹ Eder, S.¹⁰ Löschner, H.¹¹

9
- 0004735603
- (2000) Physikalische Blätter , vol.56 , Issue.2 , pp. 31-36
- Kassing, R.¹ Käsmaier, R.² Rangelow, I.W.³

10
- 0033267057
- (1999) J Vac Sci Technol B , vol.17 , Issue.6 , pp. 2768-2771
- Volland, B.¹ Shi, F.² Hudek, P.³ Heerlein, H.⁴ Rangelow, I.W.⁵

11
- 84925175290
- (1967) IEEE Trans Electron Devices , vol.ED-14 , pp. 117-133
- Nathanson, H.C.¹ Newell, W.E.² Wickstrom, R.A.³ Davis, J.R.⁴

12
- 0020765912
- (1983) J Electrochem Soc: Solid State Technol , vol.103 , Issue.6 , pp. 1420-1423
- Howe, R.T.¹ Muller, R.S.²

13
- 0026837056
- Fabrication of high frequency two-dimensional nanostructures for scanned probe devices
- (1992) J MEMS , vol.11 , Issue.1 , pp. 14-22
- MacDonald, N.C.¹

14
- 0004808677
- Lithography and reactive ion etching
- University of Kassel, ITP
- (1998) Student Text Book
- Hudek, P.¹ Rangelow, I.W.²

15
- 4243636861
- (1998) Microelectron Engng , vol.41-42 , pp. 237-240
- Gotszalk, T.¹ Grabiec, P.² Shi, F.³ Dumania, P.⁴ Hudek, P.⁵ Rangelow, I.W.⁶

16
- 0004737032
- 30 September-5 October, Santa Clara, CA, USA. Bellingham, MA: SPIE
- (1990) Proceedings of the Microelectronic Processing Integration , vol.1392 , pp. 240-245
- Rangelow, I.W.¹ Fichelscher, A.²

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.