Effective method for stress reduction in thick porous silicon films

Applied Physics Letters

Volumn 80, Issue 13, 2002, Pages 2287-2289

  Kim, Han Su ^a   Zouzounis, Eric C ^a   Xie, Ya Hong ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANODIZATIONS; DESORPTION OF HYDROGEN; HF CONCENTRATION; MASS SPECTROSCOPY; ONCHIP INDUCTORS; PORE WALL; RADIO-FREQUENCY APPLICATIONS; ROOM TEMPERATURE; SI SURFACES; STANDARD SAMPLES; STRESS CONTROL; STRESS EVOLUTION; STRESS LEVELS; STRESS REDUCTION; THERMAL-ANNEALING; THICK POROUS SILICON;

COMPRESSIVE STRESS; CRYSTAL ATOMIC STRUCTURE; DESORPTION; HYDROGEN; MASS SPECTROMETRY; RADIO BROADCASTING; RADIO TRANSMISSION;

POROUS SILICON;

EID: 79956054177     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1465130     Document Type: Article

References (16)

1. L. T. Canham, Properties of Porous Silicon (INSPEC, London, 1997).
2. T. L. Lin and K. L. Wang, Appl. Phys. Lett. 49, 1104 (1986). apl APPLAB 0003-6951
3. L. T. Canham, Appl. Phys. Lett. 57, 1046 (1990). apl APPLAB 0003-6951
4. A. Zeitschel, A. Friedberger, W. Welser, and G. Müller, Sens. Actuators 74, 113 (1999). sac SAAPEB 0924-4247
5. V. Lehmann, W. Hönlein, H. Reisinger, A. Spitzer, H. Wendt, and J. Willer, Thin Solid Films 276, 138 (1996). tsf THSFAP 0040-6090
6. Y. H. Xie, M. R. Frei, A. J. Becker, C. A. King, D. Kossives, L. T. Gomez, and S. K. Theiss, IEEE J. Solid-State Circuits 33, 1433 (1998). iss IJSCBC 0018-9200
7. H.-S. Kim, D. Zheng, A. J. Becker, and Y. H. Xie, IEEE Electron Device Lett. 22, 275 (2001). edl EDLEDZ 0741-3106
8. H. Sugiyama and O. Nittono, J. Cryst. Growth 103, 156 (1990). jcr JCRGAE 0022-0248
9. A. Halimaoui, Y. Campidelli, A. Larre, and D. Bensahel, Phys. Status Solidi B 190, 35 (1995). psb PSSBBD 0370-1972
10. T. Unagami, J. Electrochem. Soc. 144, 1835 (1997). jes JESOAN 0013-4651
11. G. Di Francia, V. LA Ferrara, L. Lancellotti, and L. Quercia, J. Porous Mater. 7, 319 (2000). 9bj JPMAFX 1380-2224
12. P. Kratzer, E. Pehlke, M. Scheffler, M. B. Raschke, and U. Höfer, Phys. Rev. Lett. 81, 5596 (1998). prl PRLTAO 0031-9007
13. H. Nörenberg and G. A. D. Briggs, Surf. Sci. 430, 154 (1999). sus SUSCAS 0039-6028
14. M. Ohring, The Materials Science of Thin Films (Academic, San Diego, 1991).
15. K. N. Tu, J. W. Mayer, and L. C. Feldman, Electronic Thin Film Science (Macmillan, New York, 1992).
16. M. E. Keeffe, C. C. Umbach, and J. M. Blakely, J. Phys. Chem. Solids 55, 965 (1994). jpx JPCSAW 0022-3697