A novel capacitor technology based on porous silicon

Thin Solid Films

Volumn 276, Issue 1-2, 1996, Pages 138-142

  Lehmann, V ^a   Honlein W ^a   Reisinger, H ^a   Spitzer, A ^a   Wendt, H ^a   Willer, J ^a  

^a SIEMENS AG   (Germany)

Author keywords

Capacitors; Dielectrics; Etching; Silicon

Indexed keywords

CAPACITANCE; DIELECTRIC MATERIALS; ELECTRIC RESISTANCE; ELECTROCHEMISTRY; ETCHING; POROUS SILICON; SUBSTRATES; THERMAL EFFECTS;

MACROPOROUS SILICON;

CAPACITORS;

EID: 0030120399     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(95)08038-4     Document Type: Article

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