Negative tone imaging (NTI) at the 22nm node: Process and material development

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7972, Issue , 2011, Pages

  Cantone, Jason ^a   Petrillo, Karen ^b   Xu, Yongan ^b   Landie, Guillaume ^c   Kawakami, Shinichiro ^a   Dunn, Shannon ^a   Colburn, Matt ^b  

^a TEL TECHNOLOGY CENTER   (United States)

^b IBM   (United States)

^c STMICROELECTRONICS   (Italy)

Author keywords

22nm; CD uniformity; Defectivity; Negative tone development; Negative tone imaging; Topcoatless photoresist

Indexed keywords

22NM; CD UNIFORMITY; DEFECTIVITY; NEGATIVE TONE DEVELOPMENT; NEGATIVE TONE IMAGING; TOPCOATLESS PHOTORESIST;

CHEMICAL EQUIPMENT; IMAGE QUALITY; OPTIMIZATION; SURFACE TREATMENT; SWELLING;

PHOTORESISTS;

EID: 79955907692     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.879719     Document Type: Conference Paper

References (10)

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